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Dr. Shuhai Fan
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Publications (1)
Proceedings Article | 19 March 2018 Presentation + Paper
A comparison of different methods of characterizing EUV photoresist shrinkage
Ramya Viswanathan, Scott Mansfield, Wenxin Li, Shuhai Fan, Roger Cornell, Hongxin Zhang
Proceedings Volume 10583, 105830Z (2018) https://doi.org/10.1117/12.2297695
KEYWORDS: Metrology, Etching, Photoresist materials, Scanning electron microscopy, Optical proximity correction, Extreme ultraviolet lithography, Critical dimension metrology, Deep ultraviolet, Extreme ultraviolet, Data modeling
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