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Dr. Shuji Sue Dinglee
Global Head of Lithography Technologies at Dow Inc
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Publications (1)
Proceedings Article | 4 December 2008 Paper
Novel embedded barrier layer materials for ArF non-topcoat immersion applications
Deyan Wang, Chunyi Wu, Cheng Bai Xu, George Barclay, Peter Trefonas, Shuji Dinglee
Proceedings Volume 7140, 71402I (2008) https://doi.org/10.1117/12.805299
KEYWORDS: Electron beam lithography, Photoresist materials, Photoresist developing, Polymers, Lithography, Thin film coatings, Immersion lithography, Scanners, Electroluminescence, Line edge roughness
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