Takafumi Taguchi
at Toshiba Materials Co Ltd
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 26 May 2010 Paper
Proceedings Volume 7748, 77480S (2010) https://doi.org/10.1117/12.868940
KEYWORDS: Optical lithography, Photomasks, Lithography, Etching, Critical dimension metrology, Design for manufacturing, Optical proximity correction, Semiconducting wafers, Design for manufacturability, Deposition processes

Proceedings Article | 11 May 2009 Paper
Proceedings Volume 7379, 73791O (2009) https://doi.org/10.1117/12.824301
KEYWORDS: Optical proximity correction, Reactive ion etching, Lithography, Personal protective equipment, Design for manufacturing, Etching, Optical design, 3D modeling, Photomasks, Critical dimension metrology

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