Dr. Takeo Ishibashi
at Renesas Technology Corp
SPIE Involvement:
Author
Publications (12)

Proceedings Article | 1 April 2009 Paper
Takuya Hagiwara, Mamoru Terai, Takeo Ishibashi, Tomofumi Miyauchi, Shinya Hori, Teruhiko Kumada, Tomoya Kumagai, Atsushi Sawano, Kosuke Doi, Takeshi Matsunobe, Naoki Man, Hirofumi Seki, Yusaku Tanahashi, Tetsuro Hanawa
Proceedings Volume 7273, 727324 (2009) https://doi.org/10.1117/12.813643
KEYWORDS: Polymers, Photoresist processing, Semiconducting wafers, Lithography, Coating, Photomasks, Chemical analysis, Critical dimension metrology, Fluorine, Scanners

Proceedings Article | 4 December 2008 Paper
Toru Umeda, Takeo Ishibashi, Atsushi Nakamura, Junichi Ide, Masaru Nagano, Koichi Omura, Shuichi Tsuzuki, Toru Numaguchi
Proceedings Volume 7140, 71402Z (2008) https://doi.org/10.1117/12.804672
KEYWORDS: Semiconducting wafers, Particles, Microfluidics, Scanning electron microscopy, Liquids, Photoresist processing, Semiconductors, Manufacturing, Optical filters, Standards development

Proceedings Article | 26 March 2008 Paper
Proceedings Volume 6923, 69231V (2008) https://doi.org/10.1117/12.771794
KEYWORDS: Semiconducting wafers, Coating, Silicon, Head-mounted displays, Immersion lithography, Manufacturing, Fluorine, Particles, Calcium, Prototyping

Proceedings Article | 7 March 2008 Paper
Mamoru Terai, Takeo Ishibashi, Masaaki Shinohara, Kazumasa Yonekura, Takuya Hagiwara, Tetsuro Hanawa, Teruhiko Kumada
Proceedings Volume 6924, 692420 (2008) https://doi.org/10.1117/12.771855
KEYWORDS: Etching, Double patterning technology, Silicon, Optical lithography, Coating, Photomasks, FT-IR spectroscopy, Photoresist processing, Silica, Scanning electron microscopy

Proceedings Article | 2 April 2007 Paper
Yoshiharu Ono, Takeo Ishibashi, Atsumi Yamaguchi, Tetsuro Hanawa, Masahiro Tadokoro, Kazunori Yoshikawa, Kazumasa Yonekura, Keiko Matsuda, Takeshi Matsunobe, Yasushi Fujii, Takeshi Tanaka
Proceedings Volume 6519, 65192O (2007) https://doi.org/10.1117/12.707615
KEYWORDS: System on a chip, Plasma treatment, Refractive index, Etching, Reflectivity, Carbon, Plasma, FT-IR spectroscopy, Raman spectroscopy, Photoresist processing

Showing 5 of 12 publications
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