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Teun Nevels
at SCIL Nanoimprint Solutions
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Publications (2)
Proceedings Article | 5 March 2021 Presentation + Paper
SCIL wafer scale direct nanoimprint for nanophotonic components and fast optical quality inspection with single nm resolution
Marc Verschuuren, Teun Nevels, Mohammad Ramezani, Jeroen Visser, Rob Voorkamp
Proceedings Volume 11696, 116960U (2021) https://doi.org/10.1117/12.2577310
KEYWORDS: Semiconducting wafers, Nanoimprint lithography, Inspection, Wafer-level optics, Nanophotonics, Optical inspection, Silicon, Objectives, Sol-gels, Silica
Proceedings Article | 22 February 2021 Presentation
SCIL nanoimprint: wafer scale overlay alignment and single nm reproductibility by Fourrier scatterometry
Marc Verschuuren, Teun Nevels, Mohammad Ramezani, Jeroen Visser, Rob Voorkamp
Proceedings Volume 11610, 1161009 (2021) https://doi.org/10.1117/12.2583654
KEYWORDS: Semiconducting wafers, Optical alignment, Nanoimprint lithography, Scatterometry, Overlay metrology, Silicon, Silica, Objectives, Nanophotonics, Inspection
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