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Todd J. Hoppe
Process Engineer at Intel Corp
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Publications (2)
Proceedings Article | 10 April 2024 Presentation
DSA materials and processes development for ≤ P24 EUV resist L/S pattern rectification
Eungnak Han, Gurpreet Singh, Tayseer Mahdi, Robert Seidel, Sandra Murcia, Lauren Doyle, Nityan Nair, Nafees Kabir, Sean Pursel, David Shykind, Todd Hoppe, Florian Gstrein
Proceedings Volume PC12956, PC129560P (2024) https://doi.org/10.1117/12.3012612
KEYWORDS: Directed self assembly, Extreme ultraviolet, Materials processing, Extreme ultraviolet lithography, Block copolymers, Surface roughness, Scanners, Optical lithography, Objectives, Fabrication
Proceedings Article | 10 April 2024 Presentation + Paper
Practical LWR sampling approaches for advanced patterning
Pulkit Saksena, Michael Thompson, Sinan Selcuk, Anupam K. C., Jonathan Pegan, Alexander Hryn, Jinnie Aloysius, Sandip Argekar, Mohan Yadav, Abhishek Agrawal, Todd Hoppe, Sarthak Havelia, Chris Mack, Martin McCallum, Charles Wallace
Proceedings Volume 12955, 129550M (2024) https://doi.org/10.1117/12.3010906
KEYWORDS: Line width roughness, Optical lithography, Scanners, Photoresist materials, Light sources and illumination, Extreme ultraviolet lithography
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