The influence of growth conditions on properties of high temperature GaN (HT-GaN) buffer used in AlGaN/GaN HEMT
heterostructures was studied. Many various factors are presumed to have significant impact on the concluding properties
of HT-GaN buffer. In this paper the nucleation layer growth time as well as temperature during high temperature GaN
layer growth was selected as a factors alleged to cause variation in final GaN layer properties. The study was designed to
show step by step improvement of HT-GaN buffer with consecutive changes of particular parameters. Electrical
properties of the AlGaN/GaN heterostructures were determined using impedance spectroscopy method performed with
HP 4192A impedance meter equipped in two contact mercury probe. Laser reflectance traces acquired in-situ during
MOVPE (Metalorganic Vapor Phase Epitaxy) growth were compered and analyzed in order to correlate growth
mechanism with electrical properties of HT-GaN buffer. The improvement of HT-GaN resistivity was shown through
decrement of capacitance in the depleted space-charge region.
Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks.
You are receiving this notice because your organization may not have SPIE eBooks access.*
*Shibboleth/Open Athens users─please
sign in
to access your institution's subscriptions.
To obtain this item, you may purchase the complete book in print or electronic format on
SPIE.org.
INSTITUTIONAL Select your institution to access the SPIE Digital Library.
PERSONAL Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.