Mr. Twan van den Hoogenhoff Profile

Twan van den Hoogenhoff

at ASML Netherlands BV

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Publications (1)

Proceedings Article | 9 October 2019 Presentation + Paper

Particle on EUV pellicles, impact on LWR

Michiel Kupers, Gijsbert Rispens, Lokesh Devaraj, Gerardo Bottiglieri, Twan van den Hoogenhoff, Par Broman, Andreas Erdmann, Felix Wahlisch

Proceedings Volume 11147, 111470S (2019) https://doi.org/10.1117/12.2537103

KEYWORDS: Particles, Line width roughness, Pellicles, Semiconducting wafers, Extreme ultraviolet, Reticles, Scanners, Extreme ultraviolet lithography, Photomasks

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