Mr. Werner V. Brandt Profile

Werner V. Brandt

Director/Equipment Development

SPIE Involvement:

Author

Publications (7)

Proceedings Article | 11 October 2016 Paper

XIPE: the x-ray imaging polarimetry explorer

P. Soffitta, R. Bellazzini, E. Bozzo, V. Burwitz, A. Castro-Tirado, E. Costa, T. Courvoisier, H. Feng, S. Gburek, R. Goosmann, V. Karas, G. Matt, F. Muleri, K. Nandra, M. Pearce, J. Poutanen, V. Reglero, D. Sabau Maria, A. Santangelo, G. Tagliaferri, C. Tenzer, J. Vink, M. Weisskopf, S. Zane, I. Agudo, A. Antonelli, P. Attina, L. Baldini, A. Bykov, R. Carpentiero, E. Cavazzuti, E. Churazov, E. Del Monte, D. De Martino, I. Donnarumma, V. Doroshenko, Y. Evangelista, I. Ferreira, E. Gallo, N. Grosso, P. Kaaret, E. Kuulkers, J. Laranaga, L. Latronico, D. Lumb, J. Macian, J. Malzac, F. Marin, E. Massaro, M. Minuti, C. Mundell, J. U. Ness, T. Oosterbroek, S. Paltani, G. Pareschi, R. Perna, P.-O. Petrucci, H. B. Pinazo, M. Pinchera, J. P. Rodriguez, M. Roncadelli, A. Santovincenzo, S. Sazonov, C. Sgro, D. Spiga, J. Svoboda, C. Theobald, T. Theodorou, R. Turolla, E. Wilhelmi de Ona, B. Winter, A. M. Akbar, H. Allan, R. Aloisio, D. Altamirano, L. Amati, E. Amato, E. Angelakis, J. Arezu, J.-L. Atteia, M. Axelsson, M. Bachetti, L. Ballo, S. Balman, R. Bandiera, X. Barcons, S. Basso, A. Baykal, W. Becker, E. Behar, B. Beheshtipour, R. Belmont, E. Berger, F. Bernardini, S. Bianchi, G. Bisnovatyi-Kogan, P. Blasi, P. Blay, A. Bodaghee, M. Boer, M. Boettcher, S. Bogdanov, I. Bombaci, R. Bonino, J. Braga, W. Brandt, A. Brez, N. Bucciantini, L. Burderi, I. Caiazzo, R. Campana, S. Campana, F. Capitanio, M. Cappi, M. Cardillo, P. Casella, O. Catmabacak, B. Cenko, P. Cerda-Duran, C. Cerruti, S. Chaty, M. Chauvin, Y. Chen, J. Chenevez, M. Chernyakova, C. C. Cheung, D. Christodoulou, P. Connell, R. Corbet, F. Coti Zelati, S. Covino, W. Cui, G. Cusumano, A. D’Ai, F. D’Ammando, M. Dadina, Z. Dai, A. De Rosa, L. de Ruvo, N. Degenaar, M. Del Santo, L. Del Zanna, G. Dewangan, S. Di Cosimo, N. Di Lalla, G. Di Persio, T. Di Salvo, T. Dias, C. Done, M. Dovciak, G. Doyle, L. Ducci, R. Elsner, T. Enoto, J. Escada, P. Esposito, C. Eyles, S. Fabiani, M. Falanga, S. Falocco, Y. Fan, R. Fender, M. Feroci, C. Ferrigno, W. Forman, L. Foschini, C. Fragile, F. Fuerst, Y. Fujita, J. L. Gasent-Blesa, J. Gelfand, B. Gendre, G. Ghirlanda, G. Ghisellini, M. Giroletti, D. Goetz, E. Gogus, J.-L. Gomez, D. Gonzalez, R. Gonzalez-Riestra, E. Gotthelf, L. Gou, P. Grandi, V. Grinberg, F. Grise, C. Guidorzi, N. Gurlebeck, T. Guver, D. Haggard, M. Hardcastle, D. Hartmann, C. Haswell, A. Heger, M. Hernanz, J. Heyl, L. Ho, J. Hoormann, J. Horak, J. Huovelin, D. Huppenkothen, R. Iaria, C. Inam Sitki, A. Ingram, G. Israel, L. Izzo, M. Burgess, M. Jackson, L. Ji, J. Jiang, T. Johannsen, C. Jones, S. Jorstad, J. J. E. Kajava, M. Kalamkar, E. Kalemci, T. Kallman, A. Kamble, F. Kislat, M. Kiss, D. Klochkov, E. Koerding, M. Kolehmainen, K. Koljonen, S. Komossa, A. Kong, S. Korpela, M. Kowalinski, H. Krawczynski, I. Kreykenbohm, M. Kuss, D. Lai, M. Lan, J. Larsson, S. Laycock, D. Lazzati, D. Leahy, H. Li, J. Li, L.-X. Li, T. Li, Z. Li, M. Linares, M. Lister, H. Liu, G. Lodato, A. Lohfink, F. Longo, G. Luna, A. Lutovinov, S. Mahmoodifar, J. Maia, V. Mainieri, C. Maitra, D. Maitra, A. Majczyna, S. Maldera, D. Malyshev, A. Manfreda, A. Manousakis, R. Manuel, R. Margutti, A. Marinucci, S. Markoff, A. Marscher, H. Marshall, F. Massaro, M. McLaughlin, G. Medina-Tanco, M. Mehdipour, M. Middleton, R. Mignani, P. Mimica, T. Mineo, B. Mingo, G. Miniutti, S. M. Mirac, G. Morlino, A. Motlagh, S. Motta, A. Mushtukov, S. Nagataki, F. Nardini, J. Nattila, G. Navarro, B. Negri, Matteo Negro, S. Nenonen, V. Neustroev, F. Nicastro, A. Norton, A. Nucita, P. O’Brien, S. O’Dell, H. Odaka, B. Olmi, N. Omodei, M. Orienti, M. Orlandini, J. Osborne, L. Pacciani, V. Paliya, I. Papadakis, A. Papitto, Z. Paragi, P. Pascal, B. Paul, L. Pavan, A. Pellizzoni, E. Perinati, M. Pesce-Rollins, E. Piconcelli, A. Pili, M. Pilia, M. Pohl, G. Ponti, D. Porquet, A. Possenti, K. Postnov, I. Prandoni, N. Produit, G. Puehlhofer, B. Ramsey, M. Razzano, N. Rea, P. Reig, K. Reinsch, T. Reiprich, M. Reynolds, G. Risaliti, T. Roberts, J. Rodriguez, M. Rossi, S. Rosswog, A. Rozanska, A. Rubini, B. Rudak, D. Russell, F. Ryde, S. Sabatini, G. Sala, M. Salvati, M. Sasaki, T. Savolainen, R. Saxton, S. Scaringi, K. Schawinski, N. Schulz, A. Schwope, P. Severgnini, M. Sharon, A Shaw, A. Shearer, X. Shesheng, I. -C. Shih, K. Silva, R. Silva, E. Silver, A. Smale, F. Spada, G. Spandre, A. Stamerra, B. Stappers, S. Starrfield, L. Stawarz, N. Stergioulas, A. Stevens, H. Stiele, V. Suleimanov, R. Sunyaev, A. Slowikowska, F. Tamborra, F. Tavecchio, R. Taverna, A. Tiengo, L. Tolos, F. Tombesi, J. Tomsick, H. Tong, G. Torok, D. Torres, A. Tortosa, A. Tramacere, V. Trimble, G. Trinchieri, S. Tsygankov, M. Tuerler, S. Turriziani, F. Ursini, P. Uttley, P. Varniere, F. Vincent, E. Vurgun, C. Wang, Z. Wang, A. Watts, J. Wheeler, K. Wiersema, R. Wijnands, J. Wilms, A. Wolter, K. Wood, K. Wu, X. Wu, W. Xiangyu, F. Xie, R. Xu, S.-P. Yan, J. Yang, W. Yu, F. Yuan, A. Zajczyk, D. Zanetti, R. Zanin, C. Zanni, L. Zappacosta, A. Zdziarski, A. Zech, H. Zhang, S. Zhang, W. Zhang, A. Zoghbi

Proceedings Volume 9905, 990515 (2016) https://doi.org/10.1117/12.2233046

KEYWORDS: Physics, Astronomy, Mirrors, Observatories, Modulation, Polarimetry, X-rays, Sensors, Polarization, X-ray optics

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Proceedings Article | 11 May 2009 Paper

Advances in post AFM repair cleaning of photomask with CO2 cryogenic aerosol technology

Charles Bowers, Ivin Varghese, Mehdi Balooch, Werner Brandt

Proceedings Volume 7379, 73791I (2009) https://doi.org/10.1117/12.824295

KEYWORDS: Aerosols, Carbon dioxide, Atmospheric particles, Cryogenics, SRAF, Control systems, Personal digital assistants, Atomic force microscopy, Photomasks, Mask cleaning

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As the mask technology matures, critical printing features and sub-resolution assist features (SRAF) shrink below 100 nm, forcing critical cleaning processes to face significant challenges. These challenges include use of new materials, oxidation, chemical contamination sensitivity, proportionally decreasing printable defect size, and a requirement for a damage-free clean. CO₂ cryogenic aerosol cleaning has the potential to offer a wide process window for meeting these new challenges, if residue adder issues and damage can be eliminated. Some key differentiations of CO₂ cryogenic aerosol cleaning are the non-oxidizing and non-etching properties compared to conventional chemical wet clean processes with or without megasonics. In prior work, the feasibility of CO₂ cryogenic aerosol in post AFM repair photomask cleaning was demonstrated. In this paper, recent advancements of CO₂ cryogenic aerosol cleaning technology are presented, focusing on the traditional problem areas of particle adders, electrostatic discharge (ESD), and mask damage mitigation. Key aspects of successful CO₂ cryogenic aerosol cleaning include the spray nozzle design, CO₂ liquid purity, and system design. The design of the nozzle directly controls the size, density, and velocity of the CO₂ snow particles. Methodology and measurements of the solid CO₂ particle size and velocity distributions will be presented, and their responses to various control parameters will be discussed. Adder control can be achieved only through use of highly purified CO₂ and careful materials selection. Recent advances in CO₂ purity will be discussed and data shown. The mask cleaning efficiency by CO₂ cryogenic aerosol and damage control is essentially an optimization of the momentum of the solid CO₂ particles and elimination of adders. The previous damage threshold of 150 nm SRAF structures has been reduced to 70nm and data will be shown indicating 60 nm is possible in the near future. Data on CO₂ tribocharge mitigation, the main cause of ESD, will also be presented and application to current technology nodes discussed.

Proceedings Article | 5 November 2005 Paper

Characterization of photomask surface cleaning with cryogenic aerosol technique

S. Banerjee, C.C. Lin, S. Su, C. Bowers, H.F. Chung, W. Brandt, K. Tang

Proceedings Volume 5992, 59921H (2005) https://doi.org/10.1117/12.632226

KEYWORDS: Particles, Cryogenics, Carbon monoxide, Atmospheric particles, Photomasks, Semiconducting wafers, Aerosols, Silicon, Inspection, Air contamination

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Proceedings Article | 28 June 2005 Paper

Cryogenic aerosol cleaning of photomasks

S. Banerjee, C. Lin, S. Su, H. Chung, W. Brandt, K. Tang

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617081

KEYWORDS: Particles, Atmospheric particles, Cryogenics, Photomasks, Aerosols, Semiconducting wafers, Carbon dioxide, Silicon, Atmospheric modeling, Air contamination

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Proceedings Article | 11 March 2002 Paper

Cleaning of photomask substrates using CO2 snow

Werner Brandt

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458340

KEYWORDS: Carbon monoxide, Particles, Photomasks, Liquids, Solids, Contamination, Metals, Photoresist materials, Safety, Natural surfaces

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Proceedings Article | 18 December 1992 Paper

Jet spray cleaning of optics

Ronald Peterson, Wilfried Krone-Schmidt, Werner Brandt

Proceedings Volume 1754, (1992) https://doi.org/10.1117/12.140741

KEYWORDS: Contamination, Bidirectional reflectance transmission function, Cryogenics, Mirrors, Argon, Particles, Silica, Beryllium, Liquids, Astronomical imaging

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Proceedings Article | 18 December 1992 Paper

Pathfinder experiment on particulates after jet spray

Werner Brandt, Wilfried Krone-Schmidt, Ronald Peterson

Proceedings Volume 1754, (1992) https://doi.org/10.1117/12.140742

KEYWORDS: Particles, Contamination, Telescopes, Mirrors, Bidirectional reflectance transmission function, Semiconducting wafers, Silicon, Sensors, Visualization, Space telescopes

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Showing 5 of 7 publications

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