Polarization aberrations, such as diattenuation, can significantly affect the performance of modern polarization imaging systems. Polarization adaptive optics (P-AO) provides a means for compensating polarization aberrations, although an approach to deal with diattenuation is not yet available. In this work, we theoretically investigate the potential of a P-AO-assisted diattenuation aberrated Stokes vector measurement system. We provide a comprehensive theoretical and quantitative analysis of the properties regarding diattenuation aberration that can be compensated by P-AO to ensure the optimal performance of a Stokes vector sensing/imaging system. This work provides a solid basis for future use of P-AO in aberrated polarimetric applications.
A powerful aberration correction toolbox for intensity error correction is presented enabling restoration of the beam uniformity and the beam shape. The proposed method, referred to as intensity adaptive optics (I-AO), features the design of a dual-loop feedback control system that can function in both a sensor-based and sensorless mode. The feasibility of the approach is validated with quantitative analysis of the focal quality for an aberrated system, using both compensation methods, and paves the way for a new avenue for AO technology. These findings will benefit a wide range of applications spanning from aerospace to microscopy.
Diattenuation aberration is considered as an important element of polarization-related aberrations in various optical systems. It can disorder both the state of polarization and the intensity of a beam, and thus negatively impact the optical resolution and the correctness of the vectorial information of the optical system. Polarization adaptive optics (P-AO) has been proposed recently and serves as a novel tool to conduct polarization error corrections. However, previous cases typically focus on retardance-related aberrations, with little treatment of aberrations related to diattenuation. In this presentation, we harness the topological number of a skyrmionic beam as a criterion to discuss the boundary of the correction ability of P-AO method towards diattenuation aberration.
This presentation demonstrates the creation and characterization of a family of structured light referred to as meronic beams. The topological structures of merons (half-skyrmions) and their higher order variants are characterized, and we show how meronic beams can be generated using gradient index lens cascades. This also includes the generation of quadrumeron and quadrumeronium beams as well as more complex light fields with high beam quality. Finally, we show how meron beams of arbitrary order can be generated using spatial light modulators and can be subsequently reconfigured to demonstrate tuning of the beam profile.
Two-photon direct laser writing (TPP-DLW) in liquid crystals (LCs) enables a wide range of novel stimuli-responsive functionalities to be realised, which are potentially of interest for a range of technologies such as augmented reality (AR) / virtual reality (VR) displays, optical beamsteering, fast-switching devices and much more. In this presentation, we will demonstrate a method of fabricating mechanically deformable anisotropic films that behave as tunable diffraction gratings. These stretchable diffraction gratings have been fabricated using a combination of TPP-DLW and UV polymerization. For the fabrication of the grating, the LC director is frozen-in periodically to form alternating regions of high and low refractive index. To obtain the low and high refractive index, the LC director is locked-in at two different applied voltages to control the orientation of the director at the moment of exposure to the light source. When the free-standing films are subsequently subjected to a mechanical stress in the plane of the grating, it is found that there is a change in the grating period when observed on a polarizing optical microscope, which results in a concomitant change in the far-field diffraction pattern. Finally, our experimental findings for the diffraction intensity of the different orders in the far-field pattern are compared with predictions from simulations.
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