In this paper, we demonstrate the fabrication and measurement of the special nano-graphene-detectors for infrared (IR)
radiation. We first transfer the graphene film with a thickness in nanometer scale onto different infrared wafer including
Ge, GaAs, Si, and SiO2. The graphene microstructures consist of the transferred graphene film over IR wafer and metal
electrodes fabricated over graphene sheet utilized. Because of the special band structure, the fabricated graphene
microstructures can generate a large number of electron-hole pairs in a relatively broad wavelength range including
ultraviolet (UV), visible, IR, and THz wavelength. In our studies, the current-voltage relationship of the graphene
microstructure fabricated, which means that certain direct voltage is applied over two metal electrodes fabricated, is
measured before and after illumination graphene microstructure by IR lasers. As tested, the graphene microstructures
demonstrate a high optical transmittance in several typical wavelength range mentioned above. We also research the
current-voltage performance of the graphene microstructure. The typical result is as follows: when the graphene
microstructure is illuminated by the laser beam of 1.1μm wavelength and 0.9W power, an inflection point and
remarkable current gain can be discovered. Because of the low light absorption of graphene film, the photocurrent of the
graphene microstructure is limited in about 1~3mA/W under certain voltage applied. We believe that the nanometer
graphene film and semiconductor materials connected directly with graphene film already forms a kind of special energy
band gap, which affect the photocurrent generation.
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