Dr. Jinhwan Byeon
at Gwangju Institute of Science and Technology
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 13 November 2024 Poster
Proceedings Volume PC13215, PC132150S (2024) https://doi.org/10.1117/12.3034450
KEYWORDS: Photoresist developing, Extreme ultraviolet lithography, Photoresist materials, Extreme ultraviolet, Metals, Optical lithography, Nanotechnology, Nanofabrication, Surface roughness, Standards development

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