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The wide energy range and tunability of synchrotron radiation provide soft x-ray photoemission spectroscopy (SXPS) with several effective methods for characterizing metal-semiconductor interfaces on an atomic scale. These SXPS techniques reveal that metal-semiconductor interfaces are in general not abrupt and that the detailed atomic structure is a controlling factor in determining interface electronic structure.
L J Brillson
"Soft X-Ray Photoemission Techniques For Characterizing Metal-Semiconductor Interfaces", Proc. SPIE 0447, Science with Soft X-Rays, (27 March 1984); https://doi.org/10.1117/12.939185
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L J Brillson, "Soft X-Ray Photoemission Techniques For Characterizing Metal-Semiconductor Interfaces," Proc. SPIE 0447, Science with Soft X-Rays, (27 March 1984); https://doi.org/10.1117/12.939185