Paper
27 October 2021 Optical and anisotropic stress properties of flexible (Ta2O5/SiO2)2 antireflection film deposited by E-gun evaporation with ion-beam assisted deposition
Kun-Hong Chen, Hsi-Chao Chen, Sheng-Bin Chen, Guan Yu Chen, Tsung Tse Wu, Kuo Chou Kai
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Abstract
The research proposal was used tantalum pentoxide (Ta2O5) and silicon dioxide (SiO2) as the high and low refractive index for the multilayer anti-reflection (AR) films were deposited on a flexible polyethylene terephthalate (PET) by electron-beam evaporator with ion-beam assisted deposition (IAD). The optical and stress properties of these multilayer (Ta2O5/SiO2)2 films were investigated. A homemade Phase shadow moiré interferometer was used to measure the stresses of single and multilayer films. The experimental results show the optimal oxygen pressure of Ta2O5 and SiO2 were 8 and 25 sccm, respectively for the multilayer AR coating with electron-beam evaporator. The residual stress of the multilayer film stacks changed gradually from tension to compression stresses which +3,167 MPa was for the first layer and -438 MPa for the fourth layer.
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Kun-Hong Chen, Hsi-Chao Chen, Sheng-Bin Chen, Guan Yu Chen, Tsung Tse Wu, and Kuo Chou Kai "Optical and anisotropic stress properties of flexible (Ta2O5/SiO2)2 antireflection film deposited by E-gun evaporation with ion-beam assisted deposition", Proc. SPIE 11927, Optical Technology and Measurement for Industrial Applications Conference 2021, 119270P (27 October 2021); https://doi.org/10.1117/12.2616275
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KEYWORDS
Multilayers

Tantalum

Refractive index

Oxygen

Positron emission tomography

Silica

Antireflective coatings

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