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27 April 2023 Frame generation methodology in mask tape-out flow and automation application
Binbin Yan, Miao Jiang, Futian Wang, Di Liang, Liang Li, Wei Feng, Joer Huang, Dajun Wu, Andy Lan, Jiangliu Shi
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Proceedings Volume 12496, Metrology, Inspection, and Process Control XXXVII; 124962K (2023) https://doi.org/10.1117/12.2657841
Event: SPIE Advanced Lithography + Patterning, 2023, San Jose, California, United States
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Abstract
Mask tape-out is a frequent job in wafer fabrication factories and research institutes. Frame generation is one of the important steps in mask tape-out flow. It requires extensive lithography, process integration, and mask tape-out experience; a large amount of manual work and various data preparation is included, especially when multiple products are combined into a single mask and all product conditions need to be fulfilled simultaneously. When more factors need to be considered, mistakes can be made. We develop a methodology to help frame generation, such as alignment and overlay mark design, selection and placement. It has demonstrated the ability to guide people in error-proofing work, support for frame GDS automatic generation and metrology recipe automatic generation. This is a user-friendly methodology that can reduce the frame generation difficulty and generation time from several weeks to a few minutes.
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Binbin Yan, Miao Jiang, Futian Wang, Di Liang, Liang Li, Wei Feng, Joer Huang, Dajun Wu, Andy Lan, and Jiangliu Shi "Frame generation methodology in mask tape-out flow and automation application", Proc. SPIE 12496, Metrology, Inspection, and Process Control XXXVII, 124962K (27 April 2023); https://doi.org/10.1117/12.2657841
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KEYWORDS
Optical alignment
Overlay metrology
Automation
Metrology
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