Intelligent reticle modification enabled large-area metalens patterning

Chun-yen Chou; Hsueh-li Liu; Lin-chia Huang; Wilson Guo; Peichen Yu; You-chia Chang; Yao-wei Huang; Jia-min Shieh

doi:10.1117/12.2685760

3 October 2023 Intelligent reticle modification enabled large-area metalens patterning

Chun-yen Chou, Hsueh-li Liu, Lin-chia Huang, Wilson Guo, Peichen Yu, You-chia Chang, Yao-wei Huang, Jia-min Shieh

Proceedings Volume 12653, Nanoengineering: Fabrication, Properties, Optics, Thin Films, and Devices XX; 126530H (2023) https://doi.org/10.1117/12.2685760
Event: SPIE Nanoscience + Engineering, 2023, San Diego, California, United States

Abstract

Dielectric metalenses realized by economic photolithography technology are vital to their mass deployment in optoelectronic applications. However, pattern fidelity has become a serious issue that degrades the device performance due to optical proximity effects. Here, we demonstrate an intelligent reticle modification system which modifies the sizes and shapes of designed patterns based on a neural-network U-net lithographic model to produce nanostructures with desired dimensions. We demonstrate 2 mm-diameter visible metalenses with diffraction-limited focusing using DUV KrF 248 nm photolithography. This work bridges between the semiconductor process and lens-making industries to realize high-volume manufacturing of versatile metalens and metasurface products.

Conference Presentation

(2023) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Chun-yen Chou, Hsueh-li Liu, Lin-chia Huang, Wilson Guo, Peichen Yu, You-chia Chang, Yao-wei Huang, and Jia-min Shieh "Intelligent reticle modification enabled large-area metalens patterning", Proc. SPIE 12653, Nanoengineering: Fabrication, Properties, Optics, Thin Films, and Devices XX, 126530H (3 October 2023); https://doi.org/10.1117/12.2685760

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