Mr. Yuyu Liu Profile

Yuyu Liu

at National Yang Ming Chiao Tung Univ.

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Author

Publications (7)

Proceedings Article | 10 April 2024 Poster + Paper

Enhancing CD-SEM accuracy with attention-boosted Noise2Noise model

Yu Okada, Hsuehli Liu, Chieh-En Lee, Chung-Hao Tien, Peichen Yu

Proceedings Volume 12955, 129552C (2024) https://doi.org/10.1117/12.3009959

KEYWORDS: Education and training, Data modeling, Performance modeling, Denoising, Signal to noise ratio, Scanning electron microscopy, Manufacturing, Critical dimension metrology

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Proceedings Article | 4 October 2023 Presentation + Paper

Metadiffuser fabricated by DUV KrF 248nm photolithography for wavefront manipulation

Hsuehli Liu, Chunyen Chou, Linchia Huang, Wilson Guo, Peichen Yu, Chunghsuan Huang, Chaujern Cheng

Proceedings Volume 12646, 1264608 (2023) https://doi.org/10.1117/12.2677996

KEYWORDS: Photoresist materials, Optical proximity correction, Design and modelling, Wavefronts, Deep ultraviolet, Spatial light modulators, Optical lithography, Simulations, Phase conjugation, Lithography

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Proceedings Article | 3 October 2023 Presentation + Paper

Intelligent reticle modification enabled large-area metalens patterning

Chun-yen Chou, Hsueh-li Liu, Lin-chia Huang, Wilson Guo, Peichen Yu, You-chia Chang, Yao-wei Huang, Jia-min Shieh

Proceedings Volume 12653, 126530H (2023) https://doi.org/10.1117/12.2685760

KEYWORDS: Critical dimension metrology, Optical proximity correction, Optical lithography, Nanostructures, Metalenses, Silicon nitride, Reticles

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Proceedings Article | 3 October 2022 Poster

High-efficiency photolithographic NIR metalenses enabled by optical proximity correction with a neural-network lithographic model

Hsuehli Liu, Weiping Liao, Yuteng Chen, Shengsiang Su, Tongke Lin, Jiamin Shieh, Peichen Yu, Youchia Chang

Proceedings Volume PC12195, PC1219521 (2022) https://doi.org/10.1117/12.2644847

KEYWORDS: Optical proximity correction, Lithography, Optical lithography, Near infrared, Photoresist materials, Critical dimension metrology, Systems modeling, Semiconductors, Photoresist developing, Photomasks

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Proceedings Article | 3 October 2022 Poster

Near-infrared metalenses employing hyperuniform disordered arrangement of nanostructures

Sheng Siang Su, Ying Chu Wu, Hsueh Li Liu, Peichen Yu

Proceedings Volume PC12195, PC1219520 (2022) https://doi.org/10.1117/12.2644670

KEYWORDS: Nanostructures, Transmittance, Amorphous silicon, Silicon photonics, Silicon, Scattering, Polarizers, Photonics, Optical filters, Numerical simulations

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Proceedings Article | 1 August 2021 Poster

Distributed optical proximity correction with deep-learning lithographic model for i-line photolithography

Wei-Ping Liao, Yu-Fan Lin, Hsueh-Li Liu, Shu-De Gong, Peichen Yu, You-Chia Chang, Jia-Min Shieh, Chun-Chi Chen, Wen-Hsien Huang

Proceedings Volume 11804, 1180421 (2021) https://doi.org/10.1117/12.2593408

KEYWORDS: Optical lithography, Semiconductors, Transistors, Algorithm development, Critical dimension metrology, Parallel computing, Photomasks, Resolution enhancement technologies, Lithography, Optical proximity correction

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Proceedings Article | 5 March 2021 Presentation

Forecast of photovoltaic power generation using deep-learning algorithms: evaluation of LSTM, LSTM-autoencoder, and LSTM-attention-mechanism

Yu Yu Liu

Proceedings Volume 11681, 116810S (2021) https://doi.org/10.1117/12.2583409

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Showing 5 of 7 publications

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