Novel technique for performing ellipsometric measurements in a submicrometer area

Jeffrey T. Fanton; Jon L. Opsal; Allan Rosencwaig; David Willenborg

doi:10.1117/12.172605

1 March 1994 Novel technique for performing ellipsometric measurements in a submicrometer area

Jeffrey T. Fanton, Jon L. Opsal, Allan Rosencwaig, David Willenborg

Proceedings Volume 2004, Interferometry VI: Applications; (1994) https://doi.org/10.1117/12.172605
Event: SPIE's 1993 International Symposium on Optics, Imaging, and Instrumentation, 1993, San Diego, CA, United States

Abstract

We have developed a novel technique for performing simple phase-sensitive optical measurements in a sub-micrometer area. We presently use this technique to measure film stacks commonly found in the semiconductor industry. This article explains the theory behind this technique and presents several examples demonstrating the capabilities of the system.

Citation Download Citation

Jeffrey T. Fanton, Jon L. Opsal, Allan Rosencwaig, and David Willenborg "Novel technique for performing ellipsometric measurements in a submicrometer area", Proc. SPIE 2004, Interferometry VI: Applications, (1 March 1994); https://doi.org/10.1117/12.172605

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