Paper
11 November 1994 Optical behavior determination of thin film and bulk materials in the x-ray region
Michele M. Wilson, Muamer Zukic, Douglas G. Torr, Alphonsus John Fennelly, Edward L. Fry
Author Affiliations +
Abstract
Optical constant determination of thin films is critical to the design of x-ray multilayers. In the x-ray region, surface roughness, interfacial roughness, interdiffusion, volume anisotropics, etc. all act to reduce the reflection. A method is described to include all imperfections that make a real film different from an ideal film into the `optical behavior' values for each individual layer and the multilayer as a whole. These `optical behavior' values can then be used to accurately predict the performance of the multilayer.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Michele M. Wilson, Muamer Zukic, Douglas G. Torr, Alphonsus John Fennelly, and Edward L. Fry "Optical behavior determination of thin film and bulk materials in the x-ray region", Proc. SPIE 2279, Advances in Multilayer and Grazing Incidence X-Ray/EUV/FUV Optics, (11 November 1994); https://doi.org/10.1117/12.193131
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KEYWORDS
Reflectivity

X-rays

Scattering

Multilayers

Grazing incidence

X-ray optics

Deposition processes

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