Subpicometer ArF excimer laser for 193-nm lithography

Jun Akita; Hiroshi Komori; Noriaki Kouda; Shunsuke Yoshioka; Yasuo Itakura; Hakaru Mizoguchi

doi:10.1117/12.276010

7 July 1997 Subpicometer ArF excimer laser for 193-nm lithography

Jun Akita, Hiroshi Komori, Noriaki Kouda, Shunsuke Yoshioka, Yasuo Itakura, Hakaru Mizoguchi

Proceedings Volume 3051, Optical Microlithography X; (1997) https://doi.org/10.1117/12.276010
Event: Microlithography '97, 1997, Santa Clara, CA, United States

Abstract

Highly narrowed Argon Fluoride excimer laser for practical refractive exposure system with high NA and wide field size lenses is developed. The laser realizes 0.6 W at 400 Hz. The spectral bandwidth is less than 0.75 pm, the stability of central wavelength is within +/- 0.25 pm and the concentration of energy within 3- pm band is more than 95%. The gas lifetime is more than 1 X 10⁷ pulses without gas purifier. By the one gas life performance test and the short term performance test, we confirm this laser is useful for the development of microlithography process.

Citation Download Citation

Jun Akita, Hiroshi Komori, Noriaki Kouda, Shunsuke Yoshioka, Yasuo Itakura, and Hakaru Mizoguchi "Subpicometer ArF excimer laser for 193-nm lithography", Proc. SPIE 3051, Optical Microlithography X, (7 July 1997); https://doi.org/10.1117/12.276010

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