Paper
5 June 1998 Mechanical distortions in advanced optical reticles
Andrew R. Mikkelson, Michael A. Sprague, Roxann L. Engelstad, Edward G. Lovell, David Trost
Author Affiliations +
Abstract
Finite element (FE) models have been created to investigate mechanical distortions associated with mask blank fabrication and mounting in a horizontal orientation. A modal analysis was completed to quantify the natural frequencies for the mask blank as a predictive tool for possible vibration prevention or control. By modeling the substrate with layers associated with the mask fabrication process and then by prestressing these layers, the resulting out-of-plane distortions (OPD) and in-plane distortions (IPD) can be determined. Utilizing these models, the magnitude of the maximum IPD and OPD due to gravity have been determined as a function of the mounting location to optimize the mounting position.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Andrew R. Mikkelson, Michael A. Sprague, Roxann L. Engelstad, Edward G. Lovell, and David Trost "Mechanical distortions in advanced optical reticles", Proc. SPIE 3331, Emerging Lithographic Technologies II, (5 June 1998); https://doi.org/10.1117/12.309622
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Cited by 7 scholarly publications.
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KEYWORDS
Reticles

Chromium

3D modeling

Solids

Kinematics

Photomasks

Polymethylmethacrylate

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