Optical design forms for DUV and VUV microlithographic processes

James E. Webb; Julie Bentley; Paul F. Michaloski; Anthony R. Phillips; Ted Tienvieri

doi:10.1117/12.435754

14 September 2001 Optical design forms for DUV and VUV microlithographic processes

James E. Webb, Julie Bentley, Paul F. Michaloski, Anthony R. Phillips, Ted Tienvieri

Proceedings Volume 4346, Optical Microlithography XIV; (2001) https://doi.org/10.1117/12.435754
Event: 26th Annual International Symposium on Microlithography, 2001, Santa Clara, CA, United States

Abstract

Microlithographic objectives have been developed for deep ultraviolet and vacuum ultraviolet wavelengths used for printing and inspection applications related to microlithographic processes. Refractive and catadioptric design solutions using fused silica, calcium fluoride and other crystals are discussed. Several reflective and catadioptric design forms having central obscurations will be compared to refractive forms. Design complexity, performance and limitations are compared.

Citation Download Citation

James E. Webb, Julie Bentley, Paul F. Michaloski, Anthony R. Phillips, and Ted Tienvieri "Optical design forms for DUV and VUV microlithographic processes", Proc. SPIE 4346, Optical Microlithography XIV, (14 September 2001); https://doi.org/10.1117/12.435754

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