Mr. Paul F. Michaloski Profile

Paul F. Michaloski

Senior Engineering Associate, Optical Design at Corning Advanced Optics

SPIE Involvement:

Author

Proceedings Article | 21 June 2019 Paper

Polarization metrology for high numerical aperture DUV objectives

Robert Grejda, Duncan Spaulding, Paul Michaloski, Robert Michaels, Stephen Mack, Paul Dewa, David Aronstein

Proceedings Volume 11057, 110570P (2019) https://doi.org/10.1117/12.2525606

KEYWORDS: Polarization, Polarimetry, Objectives, Birefringence, Deep ultraviolet, Crystals, Sensors, Nanolithography, Thin film coatings, Silica

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Proceedings Article | 21 September 2011 Paper

A laser speckle reduction system

Joshua Cobb, Paul Michaloski

Proceedings Volume 8170, 81700D (2011) https://doi.org/10.1117/12.896811

KEYWORDS: Diffusers, Mirrors, Speckle, Interferometers, Microelectromechanical systems, Beam splitters, Speckle pattern, Wavefronts, Collimation, Cameras

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Proceedings Article | 9 September 2010 Paper

IODC 2010 illumination design problem

Narkis Shatz, Paul Michaloski, Josh Cobb, Roland Winston, Vladimir Oliker

Proceedings Volume 7652, 76522J (2010) https://doi.org/10.1117/12.873301

KEYWORDS: Sensors, Dielectrics, Solar concentrators, GRIN lenses, Reflectivity, Mirrors, Light, Light sources and illumination, Refractive index, Absorption

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Proceedings Article | 29 September 2004 Open Access

Requirements and designs of illuminators for microlithography

Paul Michaloski

Proceedings Volume 5525, (2004) https://doi.org/10.1117/12.563941

KEYWORDS: Fiber optic illuminators, Semiconducting wafers, Diffusers, Lithography, Reticles, Optical lithography, Lamps, Relays, Wafer-level optics, Axicons

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Proceedings Article | 14 September 2001 Paper

Optical design forms for DUV and VUV microlithographic processes

Anthony Phillips, Julie Bentley, James Webb, Ted Tienvieri, Paul Michaloski

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435754

KEYWORDS: Objectives, Colorimetry, Combined lens-mirror systems, Mirrors, Deep ultraviolet, Inspection, Reflectivity, Surface finishing, Vacuum ultraviolet, Excimer lasers

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Proceedings Article | 21 September 1998 Paper

Method of evaluating and tolerancing interferometer designs

Jon Fleig, Andrew Kulawiec, Paul Michaloski

Proceedings Volume 3482, (1998) https://doi.org/10.1117/12.322054

KEYWORDS: Interferometers, Sensors, Wavefronts, Ray tracing, Collimators, Tolerancing, Monochromatic aberrations, Optical design, Geometrical optics, Imaging systems

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Proceedings Article | 6 December 1993 Paper

Building world-class microlithographic lens systems: optical material requirements and qualification methods

Paul Michaloski, Paul DeStefano

Proceedings Volume 2018, (1993) https://doi.org/10.1117/12.165236

KEYWORDS: Prisms, Cameras, Luminescence, Optical components, Silica, Telescopes, Glasses, Absorption, Refraction, Diodes

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Proceedings Article | 8 August 1993 Paper

Depth of focus and resolution enhancement of i-line and deep-UV lithography using annular illumination

Paul Tompkins, Paul Dewa, William Partlo, Paul Michaloski

Proceedings Volume 1927, (1993) https://doi.org/10.1117/12.150420

KEYWORDS: Semiconducting wafers, Deep ultraviolet, Lithographic illumination, Prototyping, Critical dimension metrology, Lithography, Imaging systems, Reticles, Axicons, Control systems

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Showing 5 of 8 publications

Conference Committee Involvement (10)

International Optical Design Conference 2021

27 June 2021 | Online Only, United States

Laser Beam Shaping XII

21 August 2011 | San Diego, California, United States

Laser Beam Shaping XI

2 August 2010 | San Diego, California, United States

Laser Beam Shaping X

3 August 2009 | San Diego, California, United States

Laser Beam Shaping IX

11 August 2008 | San Diego, California, United States

Showing 5 of 10 Conference Committees

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