Static microfield printing at the advanced light source with the ETS Set-2 optic

Patrick P. Naulleau; Kenneth A. Goldberg; Erik H. Anderson; David T. Attwood Jr.; Phillip J. Batson; Jeffrey Bokor; Paul Denham; Eric M. Gullikson; Bruce D. Harteneck; Brian Hoef; Keith H. Jackson; Deirdre L. Olynick; Senajith Rekawa; Farhad Salmassi; Kenneth L. Blaedel; Henry N. Chapman; Layton C. Hale; Regina Soufli; Eberhard Adolf Spiller; Donald W. Sweeney; John R. Taylor; Christopher C. Walton; Avijit K. Ray-Chaudhuri; Donna J. O'Connell; Richard H. Stulen; Daniel A. Tichenor; Charles W. Gwyn; Pei-yang Yan; Guojing Zhang

doi:10.1117/12.472318

1 July 2002 Static microfield printing at the Advanced Light Source with the ETS Set-2 optic

Patrick P. Naulleau, Kenneth A. Goldberg, Erik H. Anderson, David T. Attwood Jr., Phillip J. Batson, Jeffrey Bokor, Paul Denham, Eric M. Gullikson, Bruce D. Harteneck, Brian Hoef, Keith H. Jackson, Deirdre L. Olynick, Senajith Rekawa, Farhad Salmassi, Kenneth L. Blaedel, Henry N. Chapman, Layton C. Hale, Regina Soufli, Eberhard Adolf Spiller, Donald W. Sweeney, John R. Taylor, Christopher C. Walton, Avijit K. Ray-Chaudhuri, Donna J. O'Connell, Richard H. Stulen, Daniel A. Tichenor, Charles W. Gwyn, Pei-yang Yan, Guojing Zhang

Author Affiliations +

Proceedings Volume 4688, Emerging Lithographic Technologies VI; (2002) https://doi.org/10.1117/12.472318
Event: SPIE's 27th Annual International Symposium on Microlithography, 2002, Santa Clara, California, United States

Abstract

While interferometry is routinely used for the characterization and alignment of lithographic optics, the ultimate performance metric for these optics is printing in photoresist. The comparison of lithographic imaging with that predicted from wavefront performance is also useful for verifying and improving the predictive power of wavefront metrology. To address these issues, static, small-field printing capabilities have been added to the EUV phase- shifting point diffraction interferometry implemented at the Advanced Light Source at Lawrence Berkeley National Laboratory. The combined system remains extremely flexible in that switching between interferometry and imaging modes can be accomplished in approximately two weeks.

Citation Download Citation

Patrick P. Naulleau, Kenneth A. Goldberg, Erik H. Anderson, David T. Attwood Jr., Phillip J. Batson, Jeffrey Bokor, Paul Denham, Eric M. Gullikson, Bruce D. Harteneck, Brian Hoef, Keith H. Jackson, Deirdre L. Olynick, Senajith Rekawa, Farhad Salmassi, Kenneth L. Blaedel, Henry N. Chapman, Layton C. Hale, Regina Soufli, Eberhard Adolf Spiller, Donald W. Sweeney, John R. Taylor, Christopher C. Walton, Avijit K. Ray-Chaudhuri, Donna J. O'Connell, Richard H. Stulen, Daniel A. Tichenor, Charles W. Gwyn, Pei-yang Yan, and Guojing Zhang "Static microfield printing at the Advanced Light Source with the ETS Set-2 optic", Proc. SPIE 4688, Emerging Lithographic Technologies VI, (1 July 2002); https://doi.org/10.1117/12.472318

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