Influence of additional rf discharge on the properties of carbon nitride thin films deposited by PLD

Jan Lancok; Michal Novotny; Jiri Bulir; Miroslav Jelinek; Zdenik Zelinger

doi:10.1117/12.478622

9 August 2002 Influence of additional rf discharge on the properties of carbon nitride thin films deposited by PLD

Jan Lancok, Michal Novotny, Jiri Bulir, Miroslav Jelinek, Zdenik Zelinger

Proceedings Volume 4762, ALT'01 International Conference on Advanced Laser Technologies; (2002) https://doi.org/10.1117/12.478622
Event: International Conference on: Advanced Laser Technologies (ALT'01), 2001, Constanta, Romania

Abstract

Nitrogen-rich carbon nitride films were prepared by pulse laser deposition (PLD) combined with additional r.f. and hollow cathode discharges on fused silica, stainless steel and silicon substrates. The properties of combination of laser plasma with concentrated r.f. or HC discharges were studied using an optical emission spectroscopy (OES). The composition of the films was measured by WDX method. The transmission spectra and plastic microhardnes of the films were also measured.

Citation Download Citation

Jan Lancok, Michal Novotny, Jiri Bulir, Miroslav Jelinek, and Zdenik Zelinger "Influence of additional rf discharge on the properties of carbon nitride thin films deposited by PLD", Proc. SPIE 4762, ALT'01 International Conference on Advanced Laser Technologies, (9 August 2002); https://doi.org/10.1117/12.478622

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