Paper
24 December 2002 Development of EUV point diffraction interferometry using the NewSUBARU undulator radiation
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Abstract
An extreme ultra-violet phase-shifting point diffraction interferometer (PS/PDI) was studied by using the NewSUBARU[1] undulator radiation. The beam line was equipped with a monochromator for PDI measurement. To improve the converging performance of the undulator radiation, a new beam line suitable for PDI was designed. From the examination of monochromaticity required for PDI, the 0th-order light of the monochromator was used in the experiment. The higher-order radiation of the undulator was eliminated by the reflection band of the Mo/Si multilayer mirrors. By means of improvements of the pre-alignment method and of the mask structure, a higher contrast than ever was achieved in the interference fringes.
© (2002) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Masahito Niibe, Mikihito Mukai, Takeshi Tanaka, Katsumi Sugisaki, Yucong Zhu, and Yoshio Gomei "Development of EUV point diffraction interferometry using the NewSUBARU undulator radiation", Proc. SPIE 4782, X-Ray Mirrors, Crystals, and Multilayers II, (24 December 2002); https://doi.org/10.1117/12.451354
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Cited by 2 scholarly publications.
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KEYWORDS
Mirrors

Monochromators

Optical testing

Photons

Extreme ultraviolet

Diffraction

Diffraction gratings

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