Paper
6 December 2004 A proposal for an MCC (Multi-column cell with lotus root lens) system to be used as a mask-making e-beam tool
Hiroshi Yasuda, Takeshi Haraguchi, Akio Yamada
Author Affiliations +
Abstract
As the technology roadmap continuously goes along, pattern density increases beyond more than 250 G shots per a mask until 2010. However the total usable beam current is limited by Coulomb interaction to maximum several hundred nanoampere and by the settling time of positioning amplifier the shot rate is restricted to around 10 MHz. To overcome those restrictions we propose MCC (Multi-Column cell with Lotus Root lens) system to use for mask making. In this system plural numbers (4 or 16) of square variable shaped beams and some kinds of Cell Projection beams including triangles and fundamental DRAM or SRAM patterns are independently controlled to expose simultaneously different parts of a glass substrate. Coulomb interaction between beams of different CCs no more exists and parallel writing is carried out. With this system a mask can be exposed from four to sixteen times faster than present single column system. We evaluated the beam performance of the electron optics Proof of Concept (PoC) system of Multi-Column Cell (MCC) method. As for the two beams at the near center of 4 x 4 layout with 25 mm pitch they show the good uniformity and low interference.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hiroshi Yasuda, Takeshi Haraguchi, and Akio Yamada "A proposal for an MCC (Multi-column cell with lotus root lens) system to be used as a mask-making e-beam tool", Proc. SPIE 5567, 24th Annual BACUS Symposium on Photomask Technology, (6 December 2004); https://doi.org/10.1117/12.568255
Lens.org Logo
CITATIONS
Cited by 7 scholarly publications.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Beam shaping

Mask making

Vestigial sideband modulation

Glasses

Magnetism

Electromagnetism

Line edge roughness

RELATED CONTENT


Back to Top