Dr. Akio Yamada Profile

Dr. Akio Yamada

at Advantest Corp

SPIE Involvement:

Author

Publications (23)

Proceedings Article | 28 June 2013 Paper

Paper

Next generation electron beam lithography system F7000 for wide range applications

Hirofumi Hayakawa, Masahiro Takizawa, Masaki Kurokawa, Akiyoshi Tsuda, Masami Takigawa, Shin-ichi Hamaguchi, Akio Yamada, Kiichi Sakamoto, Takayuki Nakamura

Proceedings Volume 8701, 870103 (2013) https://doi.org/10.1117/12.2029193

KEYWORDS: Semiconducting wafers, Silicon, Electron beam lithography, Photomasks, Microelectromechanical systems, Photonics, Nanofabrication, Glasses, Vestigial sideband modulation, Electron beams

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Proceedings Article | 26 March 2013 Paper

Paper

A slim column cell of 12nm resolution for wider application of e-beam lithography

Akio Yamada, Hitoshi Tanaka, Tomohiko Abe, Youichi Shimizu

Proceedings Volume 8680, 868025 (2013) https://doi.org/10.1117/12.2011376

KEYWORDS: Magnetism, Objectives, Beam shaping, Monochromatic aberrations, Electron beams, Electromagnetism, Electron beam lithography, Cesium, Vestigial sideband modulation, Optical simulations

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Proceedings Article | 8 November 2012 Paper

Paper

Evaluation of CP shape correction for e-beam writing

Masahiro Takizawa, Keita Bunya, Hideaki Isobe, Hideaki Komami, Kenji Abe, Masaki Kurokawa, Akio Yamada, Kiichi Sakamoto, Takayuki Nakamura, Kazusumi Kuwano, Masahiro Tateishi, Larry Chau

Proceedings Volume 8522, 85222A (2012) https://doi.org/10.1117/12.964985

KEYWORDS: Chromium, Beam shaping, Vestigial sideband modulation, Printing, Manufacturing, Chemical elements, Semiconducting wafers, Photomasks, Scanning electron microscopy, Optical simulations

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Proceedings Article | 21 March 2012 Paper

Paper

Optimization of chemically amplified resist for high-volume manufacturing by electron-beam direct writing toward 14nm node and beyond

Jun-ichi Kon, Takashi Maruyama, Yoshinori Kojima, Yasushi Takahashi, Shinji Sugatani, Kozo Ogino, Hiromi Hoshino, Hideaki Isobe, Masaki Kurokawa, Akio Yamada

Proceedings Volume 8323, 832324 (2012) https://doi.org/10.1117/12.916305

KEYWORDS: Diffusion, Chemically amplified resists, Lithography, Manufacturing, Optical lithography, Photoresist processing, Scanning electron microscopy, Monte Carlo methods, High volume manufacturing, Beam analyzers

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Proceedings Article | 21 March 2012 Paper

Paper

Complementary patterning demonstration with e-beam direct writer and spacer DP process of 11nm node

Hideaki Komami, Kenji Abe, Keita Bunya, Hideaki Isobe, Masahiro Takizawa, Masaki Kurokawa, Akio Yamada, Hietami Yaegashi, Kenichi Oyama, Shohei Yamauchi

Proceedings Volume 8323, 832313 (2012) https://doi.org/10.1117/12.915821

KEYWORDS: Electron beam lithography, Double patterning technology, Photomasks, Electron beam direct write lithography, Etching, Lithography, Manufacturing, Vestigial sideband modulation, Semiconducting wafers, Overlay metrology

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Proceedings Article | 21 March 2012 Paper

Paper

CP element based design for 14nm node EBDW high volume manufacturing

Takashi Maruyama, Yasuhide Machida, Shinji Sugatani, Hiroshi Takita, Hiromi Hoshino, Toshio Hino, Masaru Ito, Akio Yamada, Tetsuya Iizuka, Satoshi Komatsu, Makoto Ikeda, Kunihiro Asada

Proceedings Volume 8323, 832314 (2012) https://doi.org/10.1117/12.916315

KEYWORDS: Logic, Multiplexers, Electron beam direct write lithography, High volume manufacturing, Semiconducting wafers, Semiconductors, Analog electronics, Chemical elements, Logic devices, Information fusion

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Proceedings Article | 14 October 2011 Paper

Paper

CD error budget of CP exposure

Masaki Kurokawa, Hideaki Isobe, Masahiro Takizawa, Keita Bunya, Hideaki Komami, Akio Yamada, Kazuhiko Shiomitsu, Kazuto Oonou

Proceedings Volume 8166, 816623 (2011) https://doi.org/10.1117/12.896781

KEYWORDS: Photomasks, Chromium, Manufacturing, Vestigial sideband modulation, Printing, Beam shaping, Binary data, Electron beam lithography, Systems modeling, Semiconducting wafers

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Proceedings Article | 22 April 2011 Paper

Paper

EB resolution capability with CP exposure

Masaki Kurokawa, Hideaki Isobe, Kenji Abe, Yoshihisa Oae, Akio Yamada, Shogo Narukawa, Mikio Ishikawa, Hiroshi Fujita, Morihisa Hoga, Naoya Hayashi

Proceedings Volume 8081, 80810A (2011) https://doi.org/10.1117/12.897272

KEYWORDS: Photomasks, Semiconducting wafers, Sensors, Quartz, Vestigial sideband modulation, Silicon, Signal detection, Image resolution, Resolution enhancement technologies, Electron beams

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Proceedings Article | 2 April 2011 Paper

Paper

Position accuracy evaluation of multi-column e-beam exposure system

Masahiro Takizawa, Hideaki Komami, Masaki Kurokawa, Akio Yamada

Proceedings Volume 7970, 79700B (2011) https://doi.org/10.1117/12.878736

KEYWORDS: Atmospheric corrections, Semiconducting wafers, Mirrors, Distortion, Control systems, Manufacturing, Overlay metrology, Data corrections, Silicon, Magnetism

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Proceedings Article | 25 September 2010 Paper

Paper

Optimization of MDP, mask writing, and mask inspection for mask manufacturing cost reduction

Masaki Yamabe, Tadao Inoue, Masahiro Shoji, Akio Yamada, Hiromichi Hoshi, Kenichi Takahara

Proceedings Volume 7823, 78230S (2010) https://doi.org/10.1117/12.864196

KEYWORDS: Photomasks, Inspection, Logic, Manufacturing, Vestigial sideband modulation, Image transmission, System integration, Extreme ultraviolet, Diagnostics, Parallel processing

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Proceedings Article | 25 September 2010 Paper

Paper

Cell projection use and multi column approach for throughput enhancement of EBDW system

Akio Yamada, Yoshihisa Ooae

Proceedings Volume 7823, 78231H (2010) https://doi.org/10.1117/12.868975

KEYWORDS: Semiconducting wafers, Beam shaping, Vestigial sideband modulation, Logic devices, Electron beam direct write lithography, Photomasks, Analog electronics, Scanning electron microscopy, Optical transfer functions, Logic

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Proceedings Article | 25 May 2010 Paper

Paper

Evaluation of throughput improvement and character projection in multi-column-cell E-beam exposure system

Akio Yamada, Yoshihisa Oae, Tatsuro Okawa, Masahiro Takizawa, Masaki Yamabe

Proceedings Volume 7748, 774816 (2010) https://doi.org/10.1117/12.864286

KEYWORDS: Photomasks, Logic devices, Beam shaping, Vestigial sideband modulation, Optical proximity correction, Power supplies, Analytical research, Analog electronics, Semiconducting wafers, Logic

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Proceedings Article | 11 March 2010 Paper

Paper

Evaluation of throughput improvement by MCC and CP in multicolumn e-beam exposure system

Akio Yamada, Yoshihisa Oae, Tatsuro Okawa, Masahiro Takizawa, Masaki Yamabe

Proceedings Volume 7637, 76370C (2010) https://doi.org/10.1117/12.846464

KEYWORDS: Photomasks, Beam shaping, Vestigial sideband modulation, Power supplies, Semiconducting wafers, Analog electronics, Analytical research, Lenses, Silicon, Calibration

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Proceedings Article | 23 September 2009 Paper

Paper

Exposure results with four column cells in multicolumn EB exposure system

Akio Yamada, Hiroshi Yasuda, Masaki Yamabe

Proceedings Volume 7488, 74881F (2009) https://doi.org/10.1117/12.829732

KEYWORDS: Calibration, Electron beams, Beam shaping, Analog electronics, Photomasks, Lenses, Power supplies, Inspection, Error analysis, Electromagnetism

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Proceedings Article | 11 May 2009 Paper

Paper

Present status of multi-column cell exposure system for mask writing

Hiroshi Yasuda, Akio Yamada, Masaki Yamabe

Proceedings Volume 7379, 737918 (2009) https://doi.org/10.1117/12.824285

KEYWORDS: Analog electronics, Photomasks, Data corrections, Electron beams, Electromagnetism, Power supplies, Lenses, Digital electronics, Vestigial sideband modulation, Beam shaping

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Proceedings Article | 17 October 2008 Paper

Paper

E-beam exposure system using multi column cell (MCC) with CP for mask writing

Akio Yamada, Hiroshi Yasuda, Masaki Yamabe

Proceedings Volume 7122, 71220K (2008) https://doi.org/10.1117/12.801564

KEYWORDS: Beam shaping, Electron beams, Data corrections, Vestigial sideband modulation, Calibration, Lenses, Electromagnetism, Analog electronics, Digital electronics, Inspection

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Proceedings Article | 19 May 2008 Paper

Paper

Multi column cell (MCC) e-beam exposure system for mask writing

Hiroshi Yasuda, Akio Yamada, Masaki Yamabe

Proceedings Volume 7028, 70280B (2008) https://doi.org/10.1117/12.793019

KEYWORDS: Photomasks, Beam shaping, Digital electronics, Vestigial sideband modulation, Inspection, Analytical research, Digital electronic circuits, Electronics, Servomechanisms, Signal detection

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Proceedings Article | 16 September 2005 Paper

Paper

Mobile multimedia library: an MPEG-7 application with camera-equipped mobile phones

Ryoma Oami, Eiji Kasutani, Akio Yamada

Proceedings Volume 5909, 59090N (2005) https://doi.org/10.1117/12.623829

KEYWORDS: Cell phones, Cameras, Visualization, Prototyping, Multimedia, Feature extraction, System identification, Navigation systems, Image processing, Internet

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Proceedings Article | 6 December 2004 Paper

Paper

A proposal for an MCC (multi-column cell with lotus root lens) system to be used as a mask-making e-beam tool

Hiroshi Yasuda, Takeshi Haraguchi, Akio Yamada

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.568255

KEYWORDS: Beam shaping, Mask making, Vestigial sideband modulation, Glasses, Magnetism, Electromagnetism, Optical amplifiers, Line edge roughness, Electron beams, Edge roughness

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Proceedings Article | 7 July 1997 Paper

Paper

Impact of the Coulomb interaction effect on delineating densely repeated 0.1-um patterns using electron-beam block exposure

Kimitoshi Takahashi, Satoru Yamazaki, Manabu Ohno, Hitoshi Watanabe, Takayuki Sakakibara, Masami Satoh, Takeo Nagata, Akio Yamada, Hiroshi Yasuda, Yasuo Nara, Nobuo Sasaki

Proceedings Volume 3048, (1997) https://doi.org/10.1117/12.275768

KEYWORDS: Resolution enhancement technologies, Electron beams, Lithography, Silicon, Electron beam lithography, Tantalum, Scanning electron microscopy, Photomicroscopy, Very large scale integration

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Proceedings Article | 16 September 1994 Paper

Paper

Video sequence quantizer for very low bit-rate moving picture coding

Akio Yamada, Mutsumi Ohta, Takao Nishitani

Proceedings Volume 2308, (1994) https://doi.org/10.1117/12.186003

KEYWORDS: Video, Computer programming, Video coding, Databases, 3D modeling, Model-based design, Motion analysis, Computer simulations, Computer graphics, Low bit rate video

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Proceedings Article | 22 October 1993 Paper

Paper

Optimal subband filters to maximize coding gain

Masayuki Tanimoto, Akio Yamada, Norio Wakatsuki

Proceedings Volume 2094, (1993) https://doi.org/10.1117/12.157983

KEYWORDS: Optimal filtering, Image compression, Electronic filtering, Computer simulations, Optical filters, Quantization, Computer programming, Image transmission, Wavelets, Image filtering

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Proceedings Article | 1 November 1991 Paper

Paper

New subband scheme for super-HDTV coding

Masayuki Tanimoto, Akio Yamada, Yoichi Naito

Proceedings Volume 1605, (1991) https://doi.org/10.1117/12.50296

KEYWORDS: Visual communications, Optical filters, Filtering (signal processing), Image processing, Image filtering, Image compression, Electronic filtering, Signal processing, Silicon, Visualization

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Showing 5 of 23 publications

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