Application of through-focus focus-metric analysis in high resolution optical metrology

Ravikiran Attota; Richard M. Silver; Thomas A. Germer; Michael Bishop; Robert Larrabee; Michael T. Stocker; Lowel Howard

doi:10.1117/12.621106

10 May 2005 Application of through-focus focus-metric analysis in high resolution optical metrology

Ravikiran Attota, Richard M. Silver, Thomas A. Germer, Michael Bishop, Robert Larrabee, Michael T. Stocker, Lowel Howard

Author Affiliations +

Proceedings Volume 5752, Metrology, Inspection, and Process Control for Microlithography XIX; (2005) https://doi.org/10.1117/12.621106
Event: Microlithography 2005, 2005, San Jose, California, United States

Abstract

The optical image of a structured target, where a particular structure repeats itself several times, varies greatly as it is moved through focus if the spacing between the structures is such that the scattered field from the edges interferes. This condition results in a different and complex optical response compared to that found for structures much farther apart. The complex optical image of a structured target in the proximity region is sensitive to the dimensions of the target and the optical parameters. By appropriately analyzing the through-focus optical image, information can be obtained regarding the target and the optical system. In the present work an array of lines is used as a structured target. Experimental data were obtained using a bright field microscope, and results were simulated using a 'modal diffraction grating model' (also known as a rigorous coupled-wave analysis (RCWA)). The gradient-energy focus-metric method was used to characterize the through-focus optical response. The resultant focus metric signature is sensitive to changes in the line width in the nanometer range, giving it potential for metrology applications and characterization of optical tools.

Citation Download Citation

Ravikiran Attota, Richard M. Silver, Thomas A. Germer, Michael Bishop, Robert Larrabee, Michael T. Stocker, and Lowel Howard "Application of through-focus focus-metric analysis in high resolution optical metrology", Proc. SPIE 5752, Metrology, Inspection, and Process Control for Microlithography XIX, (10 May 2005); https://doi.org/10.1117/12.621106

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