Paper
11 October 2005 Recent results of laser-driven EUV and soft x-rays plasma source at ENEA Frascati
Author Affiliations +
Abstract
The XeCl excimer laser Hercules at ENEA Frascati, thanks to its peculiar features, is a unique laser-facility for many irradiation experiments. Among these applications, most machine-time is devoted to drive a laser-plasma source. This laser-plasma source is used for high-resolution atomic spectroscopy, in vivo contact microscopy of biological samples, induced DNA damage, micro-radiography, generation of sub-micron luminescent pattern on Lithium Fluoride films for miniaturized active optical devices. Recently, we equipped the Hercules-driven laser plasma source with a novel Debris Mitigation System to drastically reduce the amount of hot debris emitted by the solid target (potentially dangerous for optics, filters and detectors put near the plasma). Here we will discuss the challenging attempt of stopping debris emitted by our solid-target laser plasma, in order to achieve a clean and efficient EUV source.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
P. Di Lazzaro, S. Bollanti, A. Conti, F. Flora, L. Mezi, D. Murra, and C. E. Zheng "Recent results of laser-driven EUV and soft x-rays plasma source at ENEA Frascati", Proc. SPIE 5958, Lasers and Applications, 595814 (11 October 2005); https://doi.org/10.1117/12.621079
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KEYWORDS
Plasma

Krypton

Extreme ultraviolet

Tantalum

Copper

Ions

Pulsed laser operation

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