Paper
13 June 2006 Novel x-ray optics with Si wafers and formed glass
R. Hudec, L. Pina, V. Semencova, A. Inneman, M. Skulinova, L. Sveda, M. Mika, V. Brozek, R. Kacerovsky, J. Prokop, J. Sik
Author Affiliations +
Abstract
The thermally formed thin glass foils and optically shaped Si wafers are considered to belong to the most promising technologies for future large space X-ray telescopes. We present and discuss the recent progress in these technologies, as well as properties of test mirrors produced and tested. For both technologies, both flat and curved samples have been produced and tested. The achieved profile accuracy is of order of 1 micrometer or better, while the bending technologies maintain the intrinsic fine surface microroughness of substrates (better than 0.5 nm for glass and around 0.1 nm for Si wafers).
© (2006) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
R. Hudec, L. Pina, V. Semencova, A. Inneman, M. Skulinova, L. Sveda, M. Mika, V. Brozek, R. Kacerovsky, J. Prokop, and J. Sik "Novel x-ray optics with Si wafers and formed glass", Proc. SPIE 6266, Space Telescopes and Instrumentation II: Ultraviolet to Gamma Ray, 62661H (13 June 2006); https://doi.org/10.1117/12.673306
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Cited by 5 scholarly publications.
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KEYWORDS
Semiconducting wafers

Silicon

Glasses

X-ray optics

Wafer-level optics

X-ray telescopes

X-rays

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