Hot spot-based judgment methodology for high-end photomask availability for any exposure tools

Satoshi Usui; Shigeru Hasebe; Shigeki Nojima; Kohji Hashimoto

doi:10.1117/12.681793

20 May 2006 Hot spot-based judgment methodology for high-end photomask availability for any exposure tools

Satoshi Usui, Shigeru Hasebe, Shigeki Nojima, Kohji Hashimoto

Proceedings Volume 6283, Photomask and Next-Generation Lithography Mask Technology XIII; 62832J (2006) https://doi.org/10.1117/12.681793
Event: Photomask and Next Generation Lithography Mask Technology XIII, 2006, Yokohama, Japan

Abstract

Small process window in ultra-low k₁ lithography (k₁<0.35) poses difficulties for judgment of the availability of high-end photomasks for preliminary exposure tools for high volume production ramp-up. Also, our previous judgment flow of high-end photomasks availability has several concerns. Therefore, the ultra-low k₁ lithography requires accurate judgment methodologies for high-end photomask availability with short turn-around-time (TAT). In this paper, we propose a new concept concerning hot spot-based judgment flow which consists of two stages for high-end photomask availability. Our proposed flow permits judgment of high-end photomask availability for high volume production ramp-up with short TAT.

Citation Download Citation

Satoshi Usui, Shigeru Hasebe, Shigeki Nojima, and Kohji Hashimoto "Hot spot-based judgment methodology for high-end photomask availability for any exposure tools", Proc. SPIE 6283, Photomask and Next-Generation Lithography Mask Technology XIII, 62832J (20 May 2006); https://doi.org/10.1117/12.681793

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