Shot number estimation for EB direct writing for logic LSI utilizing character-build standard-cell layout technique

Yoshihiko Kajiya; Akihiro Nakamura; Masaya Yoshikawa; Takeshi Fujino

doi:10.1117/12.681798

20 May 2006 Shot number estimation for EB direct writing for logic LSI utilizing character-build standard-cell layout technique

Yoshihiko Kajiya, Akihiro Nakamura, Masaya Yoshikawa, Takeshi Fujino

Author Affiliations +

Proceedings Volume 6283, Photomask and Next-Generation Lithography Mask Technology XIII; 62832M (2006) https://doi.org/10.1117/12.681798
Event: Photomask and Next Generation Lithography Mask Technology XIII, 2006, Yokohama, Japan

Abstract

Electron Beam direct writing (EBDW) technology is the most cost-effective lithography tool for small-volume logic-LSI fabrication. The EB exposure time will be greatly reduced by applying character-projection (CP) aperture. But the applicable number of CP aperture is limited to 25-400 depending upon EB lithography apparatus. The cell-based logic LSIs are composed of standard-cells (SCs) whose number is 400-1000. Therefore, it is impossible to implement all SCs as CP apertures, because the SCs are placed to 4-directions in general. We had proposed the new technique named 'Character-Build (CB) standard-cell', and demonstrate the most of the combination-logic SCs can be composed by only 17 CP apertures. In this paper, not only combination-logic SCs but also sequential-logic SCs are considered. The number of EB-shots and the chip-area are estimated for some sample circuits. Compared to the simply-limited SCs, The EB shot number is 30-40% reduced by using proposed CB standard-cell, when the CP aperture numbers are 20-30. Moreover, CB standard-cell was advantageous in the module area. Considering 2-directional placement of SCs, the combination of the EB apparatus with 50-100 CP apertures and the CB standard-cell technique may be the best method for high-speed EB direct-writing.

Citation Download Citation

Yoshihiko Kajiya, Akihiro Nakamura, Masaya Yoshikawa, and Takeshi Fujino "Shot number estimation for EB direct writing for logic LSI utilizing character-build standard-cell layout technique", Proc. SPIE 6283, Photomask and Next-Generation Lithography Mask Technology XIII, 62832M (20 May 2006); https://doi.org/10.1117/12.681798

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