The mechanism of ionization radiation-induced compaction in fused silica

Fan Piao; William G. Oldham

doi:10.1117/12.694507

15 January 2007 The mechanism of ionization radiation-induced compaction in fused silica

Fan Piao, William G. Oldham

Proceedings Volume 6403, Laser-Induced Damage in Optical Materials: 2006; 640320 (2007) https://doi.org/10.1117/12.694507
Event: Boulder Damage Symposium XXXVIII: Annual Symposium on Optical Materials for High Power Lasers, 2006, Boulder, Colorado, United States

Abstract

A number of fused silica samples were evaluated for their resistance to densification by deep ultraviolet (UV) radiation at 193nm wavelength. Density changes for all the samples equal the product of a material dependent constant and the absorbed two-photon dose to a sub-linear power of about 2/3. This dose dependence is consistent with earlier compaction studies using UV, electron and gamma radiation. We propose a fictive temperature model to describe fused silica structure; and the observed stretched power dependence of compaction on deposited energy for ionization damage can be explained by a simple network relaxation process. Experimental observations of isothermal-annealing behavior of UV-induced compaction in fused silica agree very well with our theoretical prediction; e.g. strong correlation between thermal recovery of compaction and the compaction rates for different fused silica samples; preheat-treatment can manipulate the compaction damage rates.

Citation Download Citation

Fan Piao and William G. Oldham "The mechanism of ionization radiation-induced compaction in fused silica", Proc. SPIE 6403, Laser-Induced Damage in Optical Materials: 2006, 640320 (15 January 2007); https://doi.org/10.1117/12.694507

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