International photomask linewidth comparison by NIST and PTB

J. Potzick; R. Dixson; R. Quintanilha; M. Stocker; A. Vladar; E. Buhr; W. Häßler-Grohne; B. Bodermann; C. G. Frase; H. Bosse

doi:10.1117/12.801435

17 October 2008 International photomask linewidth comparison by NIST and PTB

J. Potzick, R. Dixson, R. Quintanilha, M. Stocker, A. Vladar, E. Buhr, W. Häßler-Grohne, B. Bodermann, C. G. Frase, H. Bosse

Author Affiliations +

Proceedings Volume 7122, Photomask Technology 2008; 71222P (2008) https://doi.org/10.1117/12.801435
Event: SPIE Photomask Technology, 2008, Monterey, California, United States

Abstract

In preparation of the international Nano1 linewidth comparison on photomasks between 9 national metrology institutes, NIST and PTB have started a bilateral linewidth comparison in 2008, independent of and prior to the Nano1 comparison in order to test the suitability of the mask standards and the general approach to be used for the Nano1 comparison. This contribution describes the rationale of both comparisons, the design of the mask comparison standards to be used and the measurement methods applied for traceable photomask linewidth metrology at NIST and PTB.

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J. Potzick, R. Dixson, R. Quintanilha, M. Stocker, A. Vladar, E. Buhr, W. Häßler-Grohne, B. Bodermann, C. G. Frase, and H. Bosse "International photomask linewidth comparison by NIST and PTB", Proc. SPIE 7122, Photomask Technology 2008, 71222P (17 October 2008); https://doi.org/10.1117/12.801435

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