Results of an international photomask linewidth comparison of NIST and PTB

B. Bodermann; D. Bergmann; E. Buhr; W. Hässler-Grohne; H. Bosse; J. Potzick; R. Dixson; R. Quintanilha; M. Stocker; A. Vladar; N. G. Orji

doi:10.1117/12.831373

23 September 2009 Results of an international photomask linewidth comparison of NIST and PTB

B. Bodermann, D. Bergmann, E. Buhr, W. Hässler-Grohne, H. Bosse, J. Potzick, R. Dixson, R. Quintanilha, M. Stocker, A. Vladar, N. G. Orji

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Proceedings Volume 7488, Photomask Technology 2009; 74881H (2009) https://doi.org/10.1117/12.831373
Event: SPIE Photomask Technology, 2009, Monterey, California, United States

Abstract

In preparation for the international Nano1 linewidth comparison on photomasks between nine national metrology institutes, the National Institute of Standards and Technology (NIST) and the Physikalisch-Technische Bundesanstalt (PTB), initiated a bilateral linewidth comparison in 2008, independent of and prior to the Nano1 comparison in order to test the suitability of the mask standards and the general approach to be used for the Nano1 comparison. This paper reports on the current status of the bilateral comparison. In particular the methods for linewidth metrology applied at NIST and PTB and its major uncertainty contributions will be discussed based on actual measurements results for both of the mask standards chosen for the bilateral comparison.

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B. Bodermann, D. Bergmann, E. Buhr, W. Hässler-Grohne, H. Bosse, J. Potzick, R. Dixson, R. Quintanilha, M. Stocker, A. Vladar, and N. G. Orji "Results of an international photomask linewidth comparison of NIST and PTB", Proc. SPIE 7488, Photomask Technology 2009, 74881H (23 September 2009); https://doi.org/10.1117/12.831373

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