A laser-plasma clean soft x-ray source for projection microlithography

S. Bollanti; P. Di Lazzaro; F. Flora; L. Mezi; D. Murra; A. Torre

doi:10.1117/12.816912

21 April 2009 A laser-plasma clean soft x-ray source for projection microlithography

S. Bollanti, P. Di Lazzaro, F. Flora, L. Mezi, D. Murra, A. Torre

Proceedings Volume 7131, XVII International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers; 713116 (2009) https://doi.org/10.1117/12.816912
Event: XVII International Symposium on Gas Flow and Chemical Lasers and High Power Lasers, 2008, Lisboa, Portugal

Abstract

Within a National Project on nanotechnologies, at the ENEA Research Centre in Frascati a micro-exposure tool for projection lithography at 14.4 nm has been developed. The laser-plasma soft X-ray source is equipped with a patented debris mitigation system developed in the frame of a European Integrated Project, in order to preserve the collecting optics. A 90-nm-resolution patterning has been achieved on resist by this laboratory-scale tool based on a Schwarzschildtype projection optics.

Citation Download Citation

S. Bollanti, P. Di Lazzaro, F. Flora, L. Mezi, D. Murra, and A. Torre "A laser-plasma clean soft x-ray source for projection microlithography", Proc. SPIE 7131, XVII International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers, 713116 (21 April 2009); https://doi.org/10.1117/12.816912

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