Ultrafast response of negative index metamaterials in the near-infrared

David J. Cho; Wei Wu; Ekaterina Ponizovskaya; Pratik Chaturvedi; Alexander M. Bratkovksy; Shih-Yuan Wang; Xiang Zhang; Feng Wang; Y. Ron Shen

doi:10.1117/12.808455

24 February 2009 Ultrafast response of negative index metamaterials in the near-infrared

David J. Cho, Wei Wu, Ekaterina Ponizovskaya, Pratik Chaturvedi, Alexander M. Bratkovksy, Shih-Yuan Wang, Xiang Zhang, Feng Wang, Y. Ron Shen

Author Affiliations +

Proceedings Volume 7205, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics II; 72050V (2009) https://doi.org/10.1117/12.808455
Event: SPIE MOEMS-MEMS: Micro- and Nanofabrication, 2009, San Jose, California, United States

Abstract

Nanoimprint lithography is used to fabricate a metamaterial with the "fishnet" structure composed of Ag/a-Si/Ag layers that exhibits negative refractive index in the near-infrared. We have carried out a femtosecond pump-probe experiment to measure the transient photo-induced response of this structure. With a pump fluence of 330μJ/cm₂ at 800nm, the transmission at the magnetic resonance is increased by ~15.4%. The induced change originated from carrier excitation in the a-Si layer has a fast decay constant of 1.1ps.

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David J. Cho, Wei Wu, Ekaterina Ponizovskaya, Pratik Chaturvedi, Alexander M. Bratkovksy, Shih-Yuan Wang, Xiang Zhang, Feng Wang, and Y. Ron Shen "Ultrafast response of negative index metamaterials in the near-infrared", Proc. SPIE 7205, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics II, 72050V (24 February 2009); https://doi.org/10.1117/12.808455

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