Prof. Wei Wu Profile

Prof. Wei Wu

Associate Professor at Univ of Southern California

SPIE Involvement:

Author

Publications (18)

Proceedings Article | 8 March 2019 Presentation

The design and optimization of high-contrast all-dielectric metastructures for visible-range applications (Conference Presentation)

Hao Yang, He Liu, Boxaing Song, Yuanrui Li, Deming Meng, Buyun Chen, Zerui Liu, Pan Hu, Yunxiang Wang, Tse-Hsien Ou, Wei Wu

Proceedings Volume 10928, 1092809 (2019) https://doi.org/10.1117/12.2511260

KEYWORDS: Dielectrics, Edge roughness, Surface roughness, Nanophotonics, Nanofabrication, Nanotechnology, Physics

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Proceedings Article | 8 March 2019 Presentation

Investigation of plasmonic enhancement of molecular fluorescence using collapsible nanofingers (Conference Presentation)

Boxiang Song, Zerui Liu, Yunxiang Wang, Pan Hu, Stephen Cronin, Adam Schwartzberg, Stefano Cabrini, Wei Wu

Proceedings Volume 10927, 109271M (2019) https://doi.org/10.1117/12.2511224

KEYWORDS: Plasmonics, Luminescence, Nanoparticles, Molecules, Atomic layer deposition, Dielectrics, Reliability, Nanolithography, Nanoimprint lithography, Polymers

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Proceedings Article | 28 April 2017 Presentation

Optical metasurface based on hybrid high-contrast dielectric gratings for visible and near-IR ranges (Conference Presentation)

Yuhan Yao, Yifei Wang, Yuanrui Li, He Liu, Boxiang Song, Wei Wu

Proceedings Volume 10113, 1011313 (2017) https://doi.org/10.1117/12.2253494

KEYWORDS: Finite-difference time-domain method, Amorphous silicon, Silicon, Silica, Tolerancing, Dielectrics, Reflectivity, Reactive ion etching, Infrared radiation, Visible radiation

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Proceedings Article | 21 September 2015 Paper

Investigation of contamination of thin-film aluminum filters by MMH-NTO plumes exposed to UV radiation

Vaibhav Gupta, Seth Wieman, Leonid Didkovsky, Ralf Haiges, Yuhan Yao, Wei Wu, Mike Gruntman, Dan Erwin

Proceedings Volume 9604, 960408 (2015) https://doi.org/10.1117/12.2186812

KEYWORDS: Aluminum, Optical filters, Extreme ultraviolet, Contamination, Ultraviolet radiation, Scanning electron microscopy, Carbon, Thin films, Nitrogen, Oxidation

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Proceedings Article | 21 March 2012 Paper

Selective transfer of nanostructured assemblies onto an arbitrary substrate by nanoimprinting

Steven Barcelo, Min Hu, Ansoon Kim, Wei Wu, Zhiyong Li

Proceedings Volume 8323, 832306 (2012) https://doi.org/10.1117/12.916595

KEYWORDS: Particles, Gold, Surface enhanced Raman spectroscopy, Metals, Annealing, Polymers, Nanolithography, Nanoimprint lithography, Plasmonics, Molecules

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Proceedings Article | 24 April 2010 Paper

Rational engineering of highly sensitive SERS substrate based on nanocone structures

Wei Wu, Min Hu, Fung Suong Ou, R. Stanley Williams, Zhiyong Li

Proceedings Volume 7673, 76730O (2010) https://doi.org/10.1117/12.849959

KEYWORDS: Surface enhanced Raman spectroscopy, Silicon, Nanoimprint lithography, Polymers, Molecules, Raman spectroscopy, Gold, Nanolithography, Metals, Etching

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Proceedings Article | 18 March 2009 Open Access

On the integration of memristors with CMOS using nanoimprint lithography

Qiangfei Xia, W. Tong, W. Wu, J. Yang, X. Li, W. Robinett, T. Cardinali, M. Cumbie, J. Ellenson, P. Kuekes, R. S. Williams

Proceedings Volume 7271, 727106 (2009) https://doi.org/10.1117/12.814327

KEYWORDS: Nanoimprint lithography, Electrodes, Metals, Ultraviolet radiation, Reactive ion etching, Switching, Hybrid circuits, Optical lithography, CMOS technology, Nanowires

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Proceedings Article | 24 February 2009 Paper

Ultrafast response of negative index metamaterials in the near-infrared

David Cho, Wei Wu, Ekaterina Ponizovskaya, Pratik Chaturvedi, Alexander Bratkovksy, Shih-Yuan Wang, Xiang Zhang, Feng Wang, Y. Ron Shen

Proceedings Volume 7205, 72050V (2009) https://doi.org/10.1117/12.808455

KEYWORDS: Metamaterials, Nanoimprint lithography, Amorphous silicon, Modulation, Magnetism, Ultrafast phenomena, Refractive index, Femtosecond phenomena, Silicon, Reflectivity

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Proceedings Article | 18 November 2008 Paper

Properties of nanostructured metamaterials at optical frequencies

A. Bratkovsky, E. Ponozovkaya, E. Kim, W. Wu, Y. R. Shen, S.-Y. Wang, L. Thylen

Proceedings Volume 7135, 71352K (2008) https://doi.org/10.1117/12.807181

KEYWORDS: Metamaterials, Refractive index, Silver, Nanoparticles, Silicon, Modulation, Magnetism, Microwave radiation, Finite-difference time-domain method, Electromagnetism

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Proceedings Article | 14 March 2008 Paper

Fabrication and test of nano crossbar switches/MOSFET hybrid circuits by imprinting lithography

Zhiyong Li, Xuema Li, Douglas Ohlberg, Joseph Straznicky, Wei Wu, Zhaoning Yu, Julien Borghetti, William Tong, Duncan Stewart, R. Stanley Williams

Proceedings Volume 6921, 692108 (2008) https://doi.org/10.1117/12.774144

KEYWORDS: Field effect transistors, Hybrid circuits, Lithography, Resistance, Integrated circuits, Logic, Silicon, Switches, Nanoimprint lithography, Nanowires

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Proceedings Article | 6 February 2008 Paper

Fabrication of nanophotonic structures for information processing

Sean Spillane, Qianfan Xu, David Fattal, Wei Wu, Pavel Kornilovich, Raymond Beausoleil

Proceedings Volume 6883, 688302 (2008) https://doi.org/10.1117/12.764380

KEYWORDS: Nanoimprint lithography, Photonic crystals, Nanolithography, Nanophotonics, Silicon, Etching, Electron beam lithography, Quartz, Data processing, Polymers

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Proceedings Article | 18 October 2006 Paper

Toward the modulation of negative index materials by photoconductive coupling

Logeeswaran VJ, Alexander Stameroff, M. Islam, Wei Wu, Shih-Yuan Wang

Proceedings Volume 6373, 63730H (2006) https://doi.org/10.1117/12.688069

KEYWORDS: Magnetism, Modulation, Particles, Refractive index, Metamaterials, Plasma, Radio propagation, Electromagnetic radiation, Photoresistors, Split ring resonators

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Proceedings Article | 2 October 2006 Paper

Self-assembled microfabrication technology for 3D isotropic negative index material

V. Logeeswaran, M. Saif Islam, Mei-Lin Chan, David Horsley, Wei Wu, Shih-Yuan Wang

Proceedings Volume 6393, 639305 (2006) https://doi.org/10.1117/12.687140

KEYWORDS: Metals, Dielectrics, Silicon, Etching, Microfabrication, Low pressure chemical vapor deposition, Chromium, Particles, Split ring resonators, Metamaterials

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Proceedings Article | 24 March 2006 Paper

nDSE-based overlay alignment: enabling technology for nanometrology and fabrication

Jun Gao, Carl Picciotto, Wei Wu, Inkyu Park, William Tong

Proceedings Volume 6152, 615223 (2006) https://doi.org/10.1117/12.656610

KEYWORDS: Optical alignment, Detection and tracking algorithms, Algorithm development, Semiconducting wafers, Algorithms, Overlay metrology, Image processing, Error analysis, Fourier transforms, Sensing systems

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Proceedings Article | 6 May 2005 Paper

Nanoimprint lithography: the path toward high-tech, low-cost devices

William Tong, Scott Hector, Gun-Young Jung, Wei Wu, James Ellenson, Kenneth Kramer, Timothy Hostetler, Susan Richards, R. Williams

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.607236

KEYWORDS: Photomasks, Nanoimprint lithography, Optical lithography, Inspection, Optical alignment, Extreme ultraviolet lithography, Nanotechnology, Electron beam lithography, Lithography, Semiconductor manufacturing

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Nanoimprint lithography is a contact-lithography technology invented in 1996 as a low-cost alternative to photolithography for researchers who need high resolution patterning. Initially perceived as a trailing-edge technology for low-cost device fabrication, it has been recently demonstrated to achieve sub-10 nm resolution and alignment, which equal or surpass even the most advanced photolithography today. At Hewlett-Packard, we have successfully used it to fabricate switchable molecular memory arrays with a dimension of 65 nm half pitch. Nanoimprint has been placed on the International Technology Roadmap for Semiconductors (ITRS) as a candidate for next-generation lithography (NGL) for insertion in the 32 nm node in Y2013. The switch from using light to using contact to pattern will indeed bring new challenges, the most important of which are alignment and the 1x mask/template. For alignment, one imprint tool maker has achieved alignment of +/-7 nm 3 sigma using Moire patterns. For template fabrication, the lack of OPC and other sub-resolution features produced large savings in patterning, but it is nearly cancelled out by the need for more aggressive inspection because of the smaller tolerable defect size. The two combined to make the predicted cost of nanoimprint template to be similar to photomasks for 45-nm half pitch. At 32-nm half pitch, EUVL masks do not have complicated sub-resolution features and are predicted to be cheaper than comparable nanoimprint templates provided that the former’s defect levels can be reduced to what is required for economical manufacturing. In both cases, the challenges are not insurmountable and solutions are being actively pursued. However, if nanoimprint is indeed the disruptive technology to photolithography, it needs to take its initial aim at the low-end market rather than mount a frontal challenge at semiconductor manufacturing, which is the high-margin customers that photolithography will pursue and protect at all cost. The recent development in nanotechnology will lead to the commercialization of a new class of nanoscale devices requiring a high-resolution lithographic technique that does not have all the functionalities of photolithography. This approach will provide an initial customer base for nanoimprint to develop and improve and position it to challenge photolithography in the distant future.

Proceedings Article | 6 May 2005 Paper

Surface engineering for resolution enhancement in nanoimprint lithography

G. Y. Jung, W. Wu, Z. Li, S. Y. Wang, William Tong, R. Williams

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.599793

KEYWORDS: Nanoimprint lithography, Molecules, Lithography, Ultraviolet radiation, Scanning electron microscopy, Resolution enhancement technologies, Photoresist processing, Optical lithography, Capillaries, Nanowires

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Proceedings Article | 20 May 2004 Paper

Fabrication process of molecular memory circuits by nanoimprint lithography

Gun-Young Jung, S. Ganapathiappan, Xuema Li, Dougleas Ohlberg, Deidre Olynick, Yong Chen, Wei Wu, Shih-Yuan Wang, William Tong, R. Williams

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.540898

KEYWORDS: Electrodes, Nanoimprint lithography, Polymers, Titanium, Platinum, Polymer thin films, Polymethylmethacrylate, Lithography, Scanning electron microscopy, Nanowires

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Proceedings Article | 17 July 1998 Paper

Contrast gain control for color image quality

Michael D'Zmura, Tsae-Pyng Shen, Wei Wu, Homer Chen, Marius Vassiliou

Proceedings Volume 3299, (1998) https://doi.org/10.1117/12.320111

KEYWORDS: Visual process modeling, Spatial frequencies, Image quality, Image compression, Visualization, Image processing, Colorimetry, Visual compression, Visual system, Contrast sensitivity

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Showing 5 of 18 publications

Conference Committee Involvement (21)

Novel Patterning Technologies 2022

25 April 2022 | San Jose, California, United States

Novel Patterning Technologies 2021

22 February 2021 | Online Only, California, United States

Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2020

24 February 2020 | San Jose, California, United States

Nanoengineering: Fabrication, Properties, Optics, Thin Films, and Devices XVI

11 August 2019 | San Diego, California, United States

Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2019

25 February 2019 | San Jose, California, United States

Nanoengineering: Fabrication, Properties, Optics, and Devices XV

21 August 2018 | San Diego, California, United States

Novel Patterning Technologies 2018

26 February 2018 | San Jose, California, United States

Nanoengineering: Fabrication, Properties, Optics, and Devices XIV

9 August 2017 | San Diego, California, United States

Emerging Patterning Technologies 2017

27 February 2017 | San Jose, California, United States

Nanoengineering: Fabrication, Properties, Optics, and Devices XIII

30 August 2016 | San Diego, California, United States

Alternative Lithographic Technologies VIII

22 February 2016 | San Jose, California, United States

Alternative Lithographic Technologies VII

23 February 2015 | San Jose, California, United States

Alternative Lithographic Technologies VI

24 February 2014 | San Jose, California, United States

Alternative Lithographic Technologies V

25 February 2013 | San Jose, California, United States

Alternative Lithographic Technologies IV

13 February 2012 | San Jose, California, United States

Alternative Lithographic Technologies III

1 March 2011 | San Jose, California, United States

Advanced Fabrication Technologies for Micro/Nano Optics and Photonics III

25 January 2010 | San Francisco, California, United States

Advanced Fabrication Technologies for Micro/Nano Optics and Photonics II

26 January 2009 | San Jose, California, United States

Advanced Fabrication Technologies for Micro/Nano Optics and Photonics

21 January 2008 | San Jose, California, United States

Optoelectronic Devices: Physics, Fabrication, and Application IV

11 September 2007 | Boston, MA, United States

Optoelectronic Devices: Physics, Fabrication, and Application III

1 October 2006 | Boston, Massachusetts, United States

Showing 5 of 21 Conference Committees

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