Improved surface morphology and edge definition for ohmic contacts to AlGaN/GaN heterostructures

Yung-Ling Lan; Hung-Cheng Lin; Hsueh-Hsing Liu; Geng-Yen Lee; Fan Ren; Stephen J. Pearton; Mao-Nan Chang; Jen-Inn Chyi

doi:10.1117/12.810165

16 February 2009 Improved surface morphology and edge definition for ohmic contacts to AlGaN/GaN heterostructures

Yung-Ling Lan, Hung-Cheng Lin, Hsueh-Hsing Liu, Geng-Yen Lee, Fan Ren, Stephen J. Pearton, Mao-Nan Chang, Jen-Inn Chyi

Proceedings Volume 7216, Gallium Nitride Materials and Devices IV; 72162P (2009) https://doi.org/10.1117/12.810165
Event: SPIE OPTO: Integrated Optoelectronic Devices, 2009, San Jose, California, United States

Abstract

We demonstrate that Ti/Al/Cr/Mo/Au ohmic contact has an extremely smooth surface morphology of 29.0 nm and a low specific contact resistivity (ρ_c) of 1.1×10^-6 ohm-cm2 on n-type AlGaN/GaN heterostructures. The use of Cr interlayer in Ti/Al/Cr/Mo/Au contacts leads to significantly improved contact morphology without any degradation on the contact resistance. This is attributed to the reduced inter-diffusion and reaction between the layers in the contact stack.

Citation Download Citation

Yung-Ling Lan, Hung-Cheng Lin, Hsueh-Hsing Liu, Geng-Yen Lee, Fan Ren, Stephen J. Pearton, Mao-Nan Chang, and Jen-Inn Chyi "Improved surface morphology and edge definition for ohmic contacts to AlGaN/GaN heterostructures", Proc. SPIE 7216, Gallium Nitride Materials and Devices IV, 72162P (16 February 2009); https://doi.org/10.1117/12.810165

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