Study on approaches for improvement of EUV-resist sensitivity

Shinji Tarutani; Hideaki Tsubaki; Hidenori Takahashi; Takayuki Itou

doi:10.1117/12.846031

29 March 2010 Study on approaches for improvement of EUV-resist sensitivity

Shinji Tarutani, Hideaki Tsubaki, Hidenori Takahashi, Takayuki Itou

Proceedings Volume 7639, Advances in Resist Materials and Processing Technology XXVII; 763909 (2010) https://doi.org/10.1117/12.846031
Event: SPIE Advanced Lithography, 2010, San Jose, California, United States

Abstract

Several methods to improve sensitivity of EUV resist, with a couple of key points of acid generation efficiency and deprotection reaction efficiency. Larger loading of PAG to increase the secondary electron absorption possibility, cation unit design to lower the lowest unoccupied molecular orbital of cation, and lowering ionization potential of polymer to enable efficient secondary electron generation, were discussed in the viewpoint of acid generation efficiency. Larger size of anion structure design on PAG was applied to special formulation of small loading of quencher to minimize necessary generated acid concentration to give enough de-protection reaction amount, and to higher PEB temperature resist process to maximize de-protection reaction efficiency.

Citation Download Citation

Shinji Tarutani, Hideaki Tsubaki, Hidenori Takahashi, and Takayuki Itou "Study on approaches for improvement of EUV-resist sensitivity", Proc. SPIE 7639, Advances in Resist Materials and Processing Technology XXVII, 763909 (29 March 2010); https://doi.org/10.1117/12.846031

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