Compensation of mask induced aberrations by projector wavefront control

Peter Evanschitzky; Feng Shao; Tim Fühner; Andreas Erdmann

doi:10.1117/12.879207

22 March 2011 Compensation of mask induced aberrations by projector wavefront control

Peter Evanschitzky, Feng Shao, Tim Fühner, Andreas Erdmann

Proceedings Volume 7973, Optical Microlithography XXIV; 797329 (2011) https://doi.org/10.1117/12.879207
Event: SPIE Advanced Lithography, 2011, San Jose, California, United States

Abstract

Rigorous simulation of light diffraction from optical and EUV masks predicts phase effects with an aberration like impact on the imaging performance of lithographic projection systems. This paper demonstrates the application of advanced modeling and optimization methods for the compensation of mask induced aberration effects. It is shown that proper adjustment of the wavefront results in significant reduction of best focus differences between different features.

Citation Download Citation

Peter Evanschitzky, Feng Shao, Tim Fühner, and Andreas Erdmann "Compensation of mask induced aberrations by projector wavefront control", Proc. SPIE 7973, Optical Microlithography XXIV, 797329 (22 March 2011); https://doi.org/10.1117/12.879207

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