A reliable higher power ArF laser with advanced functionality for immersion lithography

Akihiko Kurosu; Masaki Nakano; Masanori Yashiro; Masaya Yoshino; Hiroaki Tsushima; Hiroyuki Masuda; Takahito Kumazaki; Shinichi Matsumoto; Kouji Kakizaki; Takashi Matsunaga; Shinji Okazaki; Junichi Fujimoto; Hakaru Mizoguchi

doi:10.1117/12.916324

13 March 2012 A reliable higher power ArF laser with advanced functionality for immersion lithography

Akihiko Kurosu, Masaki Nakano, Masanori Yashiro, Masaya Yoshino, Hiroaki Tsushima, Hiroyuki Masuda, Takahito Kumazaki, Shinichi Matsumoto, Kouji Kakizaki, Takashi Matsunaga, Shinji Okazaki, Junichi Fujimoto, Hakaru Mizoguchi

Author Affiliations +

Proceedings Volume 8326, Optical Microlithography XXV; 83261F (2012) https://doi.org/10.1117/12.916324
Event: SPIE Advanced Lithography, 2012, San Jose, California, United States

Abstract

193nm ArF eximer lasers are expected to continue to be the main solution in photolithography, since advanced lithography tecnologies such as Multiple patterning and Self-aligned double patterning (SADP) are being developed. In order to appliy these tecnologies to high-volume semiconductor manufactureing, the key is to contain chip manufactureing costs. Therefore, improvement on Reliability, Availability and Maintainability of ArF excimer lasers is important.[1] We works on improving productivity and reducing downtime of ArF exmer lasers, which leads to Reliability, Availability and Maintainability improvemnet. First in this paper, our focus drilling tecnique, which increases depth of focus (DoF) by spectral bandwidth tuning is introdueced. This focus drilling enables to increase DoF for isolated contact holes. and it not degrades the wafer stage speed.[2] Second, a technique which eables to reduce gas refill time to zero is introduced. This technique reduces downtime so Availavility is expected to improve. In this paper, we report these tecniques by using simulation resutls and partially experimental resutls provided by a semiconductor manufacturer.

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Akihiko Kurosu, Masaki Nakano, Masanori Yashiro, Masaya Yoshino, Hiroaki Tsushima, Hiroyuki Masuda, Takahito Kumazaki, Shinichi Matsumoto, Kouji Kakizaki, Takashi Matsunaga, Shinji Okazaki, Junichi Fujimoto, and Hakaru Mizoguchi "A reliable higher power ArF laser with advanced functionality for immersion lithography", Proc. SPIE 8326, Optical Microlithography XXV, 83261F (13 March 2012); https://doi.org/10.1117/12.916324

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