Dr. Shinji Okazaki Profile

Dr. Shinji Okazaki

SPIE Involvement:

Conference Program Committee | Author

Publications (54)

Proceedings Article | 27 March 2017 Presentation + Paper

Presentation + Paper

Performance of 250W high-power HVM LPP-EUV source

Hakaru Mizoguchi, Hiroaki Nakarai, Tamotsu Abe, Krzysztof Nowak, Yasufumi Kawasuji, Hiroshi Tanaka, Yukio Watanabe, Tsukasa Hori, Takeshi Kodama, Yutaka Shiraishi, Tatsuya Yanagida, Tsuyoshi Yamada, Taku Yamazaki, Shinji Okazaki, Takashi Saitou

Proceedings Volume 10143, 101431J (2017) https://doi.org/10.1117/12.2256652

KEYWORDS: Carbon dioxide lasers, Extreme ultraviolet, Light sources, Lithography, Extreme ultraviolet lithography, Plasma, Tin, Pulsed laser operation, Laser development, Gas lasers, Carbon monoxide, Amplifiers

Read Abstract +

Proceedings Article | 24 March 2017 Paper

Paper

Key components technology update of the 250W high-power LPP-EUV light source

Krzysztof Nowak, Yasufumi Kawasuji, Tsukasa Hori, Takeshi Okamoto, Hiroshi Tanaka, Yukio Watanabe, Tamotsu Abe, Takeshi Kodama, Yutaka Shiraishi, Hiroaki Nakarai, Taku Yamazaki, Shinji Okazaki, Takashi Saitou, Hakaru Mizoguchi

Proceedings Volume 10143, 101432G (2017) https://doi.org/10.1117/12.2257808

KEYWORDS: Carbon dioxide lasers, Light sources, Pulsed laser operation, Tin, Extreme ultraviolet, High power lasers, Solid state lasers, Magnetism, Gas lasers, Carbon monoxide, Laser applications, Amplifiers, Semiconductors

Read Abstract +

Proceedings Article | 22 February 2017 Open Access

Open Access

Paper

Development of 250W EUV light source for HVM lithography

Hakaru Mizoguchi, Takashi Saitou, Taku Yamazaki, Hiroaki Nakarai, Krzysztof Nowak, Yasufumi Kawasuji,, Tamotsu Abe, Hiroshi Tanaka, Yukio Watanabe, Tsukasa Hori, Takeshi Kodama, Yutaka Shiraishi, Tatsuya Yanagida, Tsuyoshi Yamada, Shinji Okazaki

Proceedings Volume 10097, 1009702 (2017) https://doi.org/10.1117/12.2261075

KEYWORDS: Extreme ultraviolet, Light sources, Lithography, Carbon dioxide lasers, Tin, Extreme ultraviolet lithography, Gas lasers, Carbon monoxide, Amplifiers, Plasma, Pulsed laser operation, Mirrors

Read Abstract +

Proceedings Article | 18 March 2016 Paper

Paper

Performance of new high-power HVM LPP-EUV source

Hakaru Mizoguchi, Hiroaki Nakarai, Tamotsu Abe, Krzysztof Nowak, Yasufumi Kawasuji, Hiroshi Tanaka, Yukio Watanabe, Tsukasa Hori, Takeshi Kodama, Yutaka Shiraishi, Tatsuya Yanagida, Tsuyoshi Yamada, Taku Yamazaki, Takashi Saitou, Shinji Okazaki

Proceedings Volume 9776, 97760J (2016) https://doi.org/10.1117/12.2218405

KEYWORDS: Carbon dioxide lasers, Extreme ultraviolet, Lithography, High power lasers, Carbon dioxide, Laser systems engineering, Amplifiers, Tin, Pulsed laser operation, Light sources, Plasma, Magnetism, Extreme ultraviolet lithography, Ions

Read Abstract +

Proceedings Article | 18 March 2016 Paper

Paper

100W EUV light-source key component technology update for HVM

Tsukasa Hori, Yasufumi Kawasuji, Takeshi Okamoto, Hiroshi Tanaka, Yukio Watanabe, Tamotsu Abe, Takeshi Kodama, Yutaka Shiraishi, Hiroaki Nakarai, Taku Yamazaki, Shinji Okazaki, Takashi Saitou, Hakaru Mizoguchi

Proceedings Volume 9776, 977625 (2016) https://doi.org/10.1117/12.2217947

KEYWORDS: Carbon dioxide lasers, Extreme ultraviolet, Tin, Pulsed laser operation, Plasma, Light sources, Laser systems engineering, High power lasers, Control systems, Mirrors, Lithography, Ions

Read Abstract +

Proceedings Article | 13 March 2015 Paper

Paper

Performance of one hundred watt HVM LPP-EUV source

Hakaru Mizoguchi, Takashi Saitou, Taku Yamazaki, Hiroaki Nakarai, Tamotsu Abe, Krzysztof Nowak, Yasufumi Kawasuji, Hiroshi Tanaka, Yukio Watanabe, Tsukasa Hori, Takeshi Kodama, Yutaka Shiraishi, Tatsuya Yanagida, Georg Soumagne, Tsuyoshi Yamada, Shinji Okazaki

Proceedings Volume 9422, 94220C (2015) https://doi.org/10.1117/12.2086347

KEYWORDS: Carbon dioxide lasers, Extreme ultraviolet, Tin, Light sources, Plasma, Pulsed laser operation, Laser systems engineering, Magnetism, Mirrors, Ions

Read Abstract +

Proceedings Article | 13 March 2015 Paper

Paper

Key components technology update of 100W HVM EUV source

Taku Yamazaki, Hakaru Mizoguchi, Hiroaki Nakarai, Tamotsu Abe, Yasufumi Kawasuji, Takeshi Okamoto, Hiroshi Tanaka, Yukio Watanabe, Tsukasa Hori, Takeshi Kodama, Yutaka Shiraishi, Shinji Okazaki, Takashi Saitou

Proceedings Volume 9422, 94222P (2015) https://doi.org/10.1117/12.2180269

KEYWORDS: Extreme ultraviolet, Carbon dioxide lasers, Tin, Plasma, Light sources, Magnetism, Mirrors, Ions, Carbon dioxide, Laser applications

Read Abstract +

Proceedings Article | 17 April 2014 Paper

Paper

Sub-hundred Watt operation demonstration of HVM LPP-EUV source

Hakaru Mizoguchi, Takashi Saitou, Taku Yamazaki, Shinji Okazaki, Hiroaki Nakarai, Tamotsu Abe, Takeshi Kodama, Tatsuya Yanagida, Tsukasa Hori, Takeshi Ohta, Krzysztof Nowak, Yasufumi Kawasuji, Hiroshi Tanaka, Yutaka Shiraishi, Yukio Watanabe, Tsuyoshi Yamada

Proceedings Volume 9048, 90480D (2014) https://doi.org/10.1117/12.2046776

KEYWORDS: Extreme ultraviolet, Carbon dioxide lasers, Tin, Mirrors, Light sources, Plasma, Pulsed laser operation, Amplifiers, Laser systems engineering, Magnetism

Read Abstract +

Since 2002, we have been developing a CO₂-Sn-LPP EUV light source, the most promising solution as the 13.5 nm high power (>200 W) light source for HVM EUV lithography. Because of its high efficiency, power scalability and spatial freedom around plasma. Our group has proposed several unique original technologies; 1) CO₂ laser driven Sn plasma generation, 2) Double laser pulse shooting for higher Sn ionization rate and higher CE. 3) Sn debris mitigation with a magnetic field, 4) Hybrid CO₂ laser system that is scalable with a combination of a short pulse oscillator and commercial cw-CO₂ amplifiers. 5) High efficient out of band light reduction with grating structured C1 mirror. In past paper we demonstrated in small size (2Hz) experimental device, this experiment shoed the advantage of combining a laser beam at a wavelength of the CO₂ laser system with Sn plasma to achieve high CE>4.7% (in maximum) from driver laser pulse energy to EUV in-band energy ¹). In this paper we report the further updated results from last paper. (1) 20um droplets at 100kHz operation was successfully ejected by downsized nozzle and demonstrated dramatical improvement of debris on the collector mirror. We have been developing extension of high CE operation condition at 20kHz range, We have reported component technology progress of EUV light source system. (2)New generation collector mirror with IR reduction technology is equipped in mirror maker. (3)20kW CO₂ laser amplifier system is demonstrated cooperate with Mitsubishi electric. (4) We develop new Proto #2 EUV LPP source system and demonstrated 200W EUV plasma power (43W EUV clean power at I/F ) at 100kHz operation was confirmed. (5) High conversion efficiency (CE) of 3.9% at 20kHz operation was confirmed in using pico-second pre-pulse laser. (6)Improvement of CO₂ laser power from 8kW to 12kW is now on going by installation of new pre-amplifier. (7)Power-up scenario of HVM source is reported, target shipment of first customer beta LPP light source unit is 2015.

Proceedings Article | 8 April 2013 Paper

Paper

LPP-EUV light source development for high volume manufacturing lithography

Hakaru Mizoguchi, Takashi Saitou, Taku Yamazaki, Shinji Okazaki, Hiroaki Nakarai, Tamotsu Abe, Takeshi Ohta, Krzysztof Nowak, Yasufumi Kawasuji, Hiroshi Tanaka, Yukio Watanabe, Tsukasa Hori, Takeshi Kodama, Yutaka Shiraishi, Tatsuya Yanagida, Tsuyoshi Yamada

Proceedings Volume 8679, 86790A (2013) https://doi.org/10.1117/12.2014139

KEYWORDS: Carbon dioxide lasers, Extreme ultraviolet, Tin, Light sources, Pulsed laser operation, Plasma, Magnetism, Chemical species, Laser systems engineering, Extreme ultraviolet lithography

Read Abstract +

Proceedings Article | 13 March 2012 Paper

Paper

A reliable higher power ArF laser with advanced functionality for immersion lithography

Masaki Nakano, Hakaru Mizoguchi, Hiroaki Tsushima, Masaya Yoshino, Junichi Fujimoto, Shinichi Matsumoto, Takashi Matsunaga, Masanori Yashiro, Akihiko Kurosu, Hiroyuki Masuda, Shinji Okazaki, Kouji Kakizaki, Takahito Kumazaki

Proceedings Volume 8326, 83261F (2012) https://doi.org/10.1117/12.916324

KEYWORDS: Excimer lasers, Control systems, Optical lithography, Laser drilling, Gas lasers, Laser development, Semiconducting wafers, Gemini Planet Imager, 193nm lithography, Manufacturing

Read Abstract +

Proceedings Article | 19 January 2005 Paper

Paper

Recent development activities and future plans for EUV lithography in Japan

Shinji Okazaki

Proceedings Volume 5592, (2005) https://doi.org/10.1117/12.570969

KEYWORDS: Extreme ultraviolet lithography, Photomasks, Light sources, Extreme ultraviolet, Metrology, Photoresist processing, Lithography, Inspection, Polymers, Reflectivity

Read Abstract +

Proceedings Article | 18 October 2004 Paper

Paper

Fabrication of aspherical mirrors for EUV projection optics set-3 of HiNA

Noriaki Kandaka, Katsuhiko Murakami, Tetsuya Oshino, Takahiro Yamamoto, Iwao Nishiyama, Shin-ichi Takahashi, Tatsuro Miyoshi, Shinji Okazaki, Hiroaki Oizumi, Hiroyuki Kondo, Masayuki Shiraishi, Takaharu Komiya, Kiyoto Mashima, Kazushi Nomura

Proceedings Volume 5533, (2004) https://doi.org/10.1117/12.559210

KEYWORDS: Mirrors, Wavefronts, Projection systems, Polishing, Semiconducting wafers, Extreme ultraviolet lithography, Spatial frequencies, Photomasks, Coating, Mirror mounts

Read Abstract +

Proceedings Article | 20 May 2004 Paper

Paper

Fabrication of aspherical mirrors for HiNA (high numerical aperture EUV exposure tool) set-3 projection optics

Masayuki Shiraishi, Kiyoto Mashima, Tetsuya Oshino, Shinji Okazaki, Tatsuro Miyoshi, Hiroaki Oizumi, Kazushi Nomura, Isa Nishiyama, Katsuhiko Murakami, Noriaki Kandaka, Hiroyuki Kondo, Takaharu Komiya, Takahiro Yamamoto

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.562365

KEYWORDS: Mirrors, Wavefronts, Projection systems, Spatial frequencies, Semiconducting wafers, Polishing, Extreme ultraviolet lithography, Photomasks, Mirror mounts, Reflectivity

Read Abstract +

Proceedings Article | 16 June 2003 Paper

Paper

Development of illumination optics and projection optics for high-NA EUV exposure tool (HiNA)

Shinji Okazaki, Katsumi Sugisaki, Katsuhiko Murakami, Kazuya Ota, Hiroyuki Kondo, Noriaki Kandaka, Iwao Nishiyama, Hiroaki Oizumi, K. Mashima, Tetsuya Oshino, Masayuki Shiraishi

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484936

KEYWORDS: Mirrors, Projection systems, Wavefronts, Extreme ultraviolet lithography, Spherical lenses, Metals, Mirror mounts, Optical components, Lithographic illumination, Photography

Read Abstract +

SPIE Journal Paper | 1 April 2003

Simulation model of in-plane distortion in extreme ultraviolet lithography mask during chucking without friction

Akira Chiba, Eiichi Hoshino, Minoru Sugawara, Hiromasa Yamanashi, Kazuya Ota, Taro Ogawa, Shinji Okazaki

JM3, Vol. 2, Issue 02, (April 2003) https://doi.org/10.1117/12.10.1117/1.1563645

KEYWORDS: Extreme ultraviolet lithography, Photomasks, Multilayers, Distortion, Mathematical modeling, Interfaces, Glasses, Tantalum, Error analysis, Quartz

Read Abstract +

SPIE Journal Paper | 1 January 2003

Pattern printability for off-axis incident light in extreme ultraviolet lithography

Minoru Sugawara, Masaaki Ito, Taro Ogawa, Eiichi Hoshino, Akira Chiba, Shinji Okazaki

JM3, Vol. 2, Issue 01, (January 2003) https://doi.org/10.1117/12.10.1117/1.1530571

KEYWORDS: Optical proximity correction, Photomasks, Critical dimension metrology, Semiconducting wafers, Nanoimprint lithography, Extreme ultraviolet lithography, Ruthenium, Head, Optical calibration, Monochromatic aberrations

Read Abstract +

Proceedings Article | 1 August 2002 Paper

Paper

Pattern printability for reflectance degradation of Mo/Si mask blanks in EUV lithography

Masaaki Ito, Minoru Sugawara, Eiichi Hoshino, Shinji Okazaki, Iwao Nishiyama, Masashi Takahashi, Hiromasa Hoko, Akira Chiba, Hiromasa Yamanashi, Byoung Lee, Takashi Yoneda, Taro Ogawa

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476991

KEYWORDS: Reflectivity, Photomasks, Binary data, Molybdenum, Silicon, Extreme ultraviolet lithography, Phase shifts, Semiconducting wafers, Ruthenium, Mirrors

Read Abstract +

Proceedings Article | 1 July 2002 Paper

Paper

Impact of EUV light scatter on CD control as a result of mask density changes

Shinji Okazaki, Christof Krautschik, Masaaki Ito, Iwao Nishiyama

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472302

KEYWORDS: Mirrors, Critical dimension metrology, Chromium, Surface roughness, Point spread functions, Extreme ultraviolet, Light scattering, Spatial frequencies, Scattering, Control systems

Read Abstract +

Proceedings Article | 1 July 2002 Paper

Paper

Aspherical mirror measurement using a point diffraction interferometer

Iwao Nishiyama, Shinji Okazaki, Katsura Otaki, Takahiro Yamamoto, Yusuke Fukuda, Kazuya Ota

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472343

KEYWORDS: Mirrors, Extreme ultraviolet, Error analysis, Spherical lenses, Point diffraction interferometers, Projection systems, Distance measurement, Interferometry, Wavefronts, Aspheric lenses

Read Abstract +

Proceedings Article | 1 July 2002 Paper

Paper

Simulation model of in-plane distortion in EUVL mask during chucking

Shinji Okazaki, Eiichi Hoshino, Akira Chiba, Minoru Sugawara, Taro Ogawa, Kazuya Ota

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472348

KEYWORDS: Photomasks, Multilayers, Extreme ultraviolet lithography, Free space, Distortion, Mathematical modeling, Image processing, Finite element methods, Finite difference methods, Lithography

Read Abstract +

Proceedings Article | 1 July 2002 Paper

Paper

Pattern printability for off-axis incident light in EUV lithography

Taro Ogawa, Eiichi Hoshino, Minoru Sugawara, Masaaki Ito, Shinji Okazaki, Akira Chiba

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472301

KEYWORDS: Optical proximity correction, Critical dimension metrology, Photomasks, Extreme ultraviolet lithography, Nanoimprint lithography, Charge-coupled devices, Ruthenium, Semiconducting wafers, Optical calibration, Monochromatic aberrations

Read Abstract +

Proceedings Article | 1 July 2002 Paper

Paper

Fine pattern replication on 10 x 10-mm exposure area using ETS-1 laboratory tool in HIT

Takeo Watanabe, Hiroshi Komano, Hideo Hada, Hiroo Kinoshita, Shinji Kishimura, Shinji Okazaki, K. Hamamoto

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472272

KEYWORDS: Photomasks, Semiconducting wafers, Extreme ultraviolet lithography, Wafer-level optics, Chemically amplified resists, Mirrors, Chromium, Edge roughness, Silicon, Scanning electron microscopy

Read Abstract +

Proceedings Article | 1 July 2002 Paper

Paper

Simulation studies of roughness-smoothing effect of molybdenum/silicon multilayer coating based on resputtering model

Eiichi Hoshino, Taro Ogawa, Hiromasa Hoko, Masaaki Ito, Hiromasa Yamanashi, Shinji Okazaki

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472346

KEYWORDS: Molybdenum, Multilayers, Silicon, Chemical species, Sputter deposition, Extreme ultraviolet lithography, Coating, Transmission electron microscopy, Argon, Photomasks

Read Abstract +

Proceedings Article | 1 July 2002 Paper

Paper

Fabrication of Mo/Si multilayer for EUVL reticle blank using ion beam sputtering

Eiichi Hoshino, Taro Ogawa, Masashi Takahashi, Hiromasa Hoko, Hiromasa Yamanashi, Byoung Lee, Takashi Yoneda, Shinji Okazaki

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472345

KEYWORDS: Multilayers, Sputter deposition, Extreme ultraviolet lithography, Reflectivity, Ion beams, Extreme ultraviolet, Reticles, Photomasks, Silicon, Molybdenum

Read Abstract +

Proceedings Article | 5 September 2001 Paper

Paper

Thermal response of EUVL mask substrate during dry etching process

Taro Ogawa, Hiromasa Yamanashi, Eiichi Hoshino, Shinji Okazaki, Hiromasa Hoko, Masaaki Ito, Akira Chiba, Takashi Yoneda, Byoung Lee, Makoto Takahashi

Proceedings Volume 4409, (2001) https://doi.org/10.1117/12.438369

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Dry etching, Silicon, Semiconducting wafers, Glasses, Temperature metrology, Quartz, Multilayers, Reflectivity

Read Abstract +

Proceedings Article | 5 September 2001 Paper

Paper

Simulation of EUVL mask defect printability

Shinji Okazaki, Taro Ogawa, Byoung Lee, Manhyoung Ryoo, Masaaki Ito

Proceedings Volume 4409, (2001) https://doi.org/10.1117/12.438371

KEYWORDS: Reflectivity, Photomasks, Opacity, Extreme ultraviolet lithography, Lithography, Extreme ultraviolet, Computer simulations, Lithographic illumination, Critical dimension metrology, Device simulation

Read Abstract +

Proceedings Article | 24 August 2001 Paper

Paper

Control of line edge roughness of ultrathin resist films subjected to EUV exposure

Ei Yano, Hiroaki Oizumi, Nobuyuki Matsuzawa, Manhyoung Ryoo, Shigeo Irie, Shigeru Shirayone, Shinji Okazaki

Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436814

KEYWORDS: Line edge roughness, Extreme ultraviolet lithography, Thin films, Lithography, Extreme ultraviolet, Atomic force microscopy, Scanning electron microscopy, Critical dimension metrology, Atomic force microscope, Image processing

Read Abstract +

Proceedings Article | 20 August 2001 Paper

Paper

Characteristics of the Ru buffer layer for EUVL mask patterning

Masashi Takahashi, Byoung Lee, Eiichi Hoshino, Taro Ogawa, Takashi Yoneda, Shinji Okazaki, Hiromasa Hoko, Akira Chiba, Hiromasa Yamanashi, Masaaki Ito, Manhyoung Ryoo

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436699

KEYWORDS: Ruthenium, Etching, Photomasks, Multilayers, Inspection, Optical lithography, Extreme ultraviolet lithography, Amorphous silicon, Reflectivity, Deep ultraviolet

Read Abstract +

Proceedings Article | 20 August 2001 Paper

Paper

Advanced point diffraction interferometer for EUV aspherical mirrors

Takahiro Yamamoto, Yusuke Fukuda, Shinji Okazaki, Kazuya Ota, Katsura Otaki, Iwao Nishiyama

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436686

KEYWORDS: Mirrors, Extreme ultraviolet, Helium, Point diffraction interferometers, Interferometers, Wavefront aberrations, Objectives, Spherical lenses, Wavefronts, Phase shifting

Read Abstract +

Proceedings Article | 20 August 2001 Paper

Paper

Tantalum nitride films for the absorber material of refractive-type EUVL mask

Hiromasa Yamanashi, Taro Ogawa, Hiromasa Hoko, Byoung Lee, Shinji Okazaki, Akira Chiba, Eiichi Hoshino, Masashi Takahashi

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436702

KEYWORDS: Tantalum, Deep ultraviolet, Reflectivity, Sputter deposition, Extreme ultraviolet lithography, Photomasks, Extreme ultraviolet, Multilayers, Silicon, Absorbance

Read Abstract +

Proceedings Article | 20 August 2001 Paper

Paper

Theoretical calculations of photoabsorption of polymers in the EUV (extreme ultraviolet) region

Shigeo Irie, Shinji Okazaki, Akihiko Ishitani, Ei Yano, Nobuyuki Matsuzawa

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436657

KEYWORDS: Polymers, Absorption, Oxygen, Chemical species, Silicon, Transmittance, Extreme ultraviolet, Extreme ultraviolet lithography, Photoresist processing, Carbon

Read Abstract +

Proceedings Article | 9 April 2001 Paper

Paper

Removal process for buffer layer on multilayer of EUVL mask

Masashi Takahashi, Hiromasa Yamanashi, Eiichi Hoshino, Taro Ogawa, Byoung Lee, Shinji Okazaki, Naoya Hirano, Masaaki Ito, Hiromasa Hoko, Akira Chiba

Proceedings Volume 4349, (2001) https://doi.org/10.1117/12.425097

KEYWORDS: Etching, Extreme ultraviolet lithography, Photomasks, Manufacturing, Multilayers, Wet etching, Deep ultraviolet, Microscopes, Inspection, Reflectivity

Read Abstract +

Proceedings Article | 22 January 2001 Paper

Paper

Dry etching of Ta absorber for EUVL masks

Eiichi Hoshino, Naoya Hirano, Shinji Okazaki, Taro Ogawa, Hiromasa Yamanashi, Akira Chiba, Masaaki Ito, Masashi Takahashi, Hiromasa Hoko

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410755

KEYWORDS: Tantalum, Photomasks, Etching, Dry etching, Extreme ultraviolet lithography, Semiconducting wafers, Silicon, Chlorine, Glasses, Plasma etching

Read Abstract +

Proceedings Article | 21 July 2000 Paper

Paper

Recent advances of three-aspherical-mirror system for EUVL

Tetsuya Oshino, Katsuhiko Murakami, Shigeo Irie, Shigeru Shirayone, Yanqiu Li, Hiroo Kinoshita, Atsushi Miyafuji, Katsumi Sugisaki, Takeo Watanabe, Shinji Okazaki

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390091

KEYWORDS: Mirrors, Extreme ultraviolet lithography, Interferometers, Multilayers, Optical alignment, Phase shifts, Reflectivity, Wavefronts, Coating, Imaging systems

Read Abstract +

Proceedings Article | 21 July 2000 Paper

Paper

Smooth low-stress sputtered tantalum and tantalum alloy films for the absorber material of reflective-type EUVL

Hiromasa Yamanashi, Taro Ogawa, Shinji Okazaki, Akira Chiba, Masashi Takahashi, Eiichi Hoshino, Naoya Hirano, Hiromasa Hoko

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390087

KEYWORDS: Tantalum, Sputter deposition, Photomasks, Extreme ultraviolet lithography, Reflectivity, Deep ultraviolet, Argon, Surface roughness, Inspection, Extreme ultraviolet

Read Abstract +

Proceedings Article | 19 July 2000 Paper

Paper

Surface preparation of EUVL mask substrate for multilayer coating by supersonic hydrocleaning technique

Naoya Hirano, Hiromasa Hoko, Taro Ogawa, Eiichi Hoshino, Akira Chiba, Hiromasa Yamanashi, Masashi Takahashi, Shinji Okazaki

Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392046

KEYWORDS: Particles, Semiconducting wafers, Extreme ultraviolet lithography, Silicon, Photomasks, Ultraviolet radiation, Atmospheric particles, Pellicles, Natural surfaces, Coating

Read Abstract +

Proceedings Article | 19 July 2000 Paper

Paper

Process scheme for removing buffer layer on multilayer for EUVL mask

Shinji Okazaki, Hiromasa Hoko, Naoya Hirano, Masashi Takahashi, Masaaki Ito, Eiichi Hoshino, Akira Chiba, Hiromasa Yamanashi, Taro Ogawa

Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392050

KEYWORDS: Etching, Tantalum, Dry etching, Extreme ultraviolet lithography, Wet etching, Photomasks, Multilayers, HF etching, Yield improvement, Silicon

Read Abstract +

Proceedings Article | 23 June 2000 Paper

Paper

Theoretical calculations of photoabsorption of molecules in the vacuum ultraviolet region

Shinji Okazaki, David Dixon, Ei Yano, Nobuyuki Matsuzawa, Shigeyasu Mori, Akihiko Ishitani

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388321

KEYWORDS: Lithography, Polymers, Photoresist materials, Absorption, Vacuum ultraviolet, Absorbance, Molecules, Copper indium disulfide, Opacity, Polymethylmethacrylate

Read Abstract +

Proceedings Article | 23 June 2000 Paper

Paper

Methods to improve radiation sensitivity of chemically amplified resists by using chain reactions of acid generation

Ei Yano, Yusuke Sakurai, Masanori Wakita, Masanori Komuro, Shinji Okazaki, Seiichi Tagawa, Seiji Nagahara, Yukio Yamamoto

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388322

KEYWORDS: Polymers, Amplifiers, Oxygen, Silver, Chemically amplified resists, Electrodes, Hydrogen, Photoresist processing, Electron beam lithography, Oxidation

Read Abstract +

Proceedings Article | 30 December 1999 Paper

Paper

Damage control during dry etching of EUV mask: I. Control of surface roughness

Eiichi Hoshino, Hiromasa Hoko, Shinji Okazaki, Masashi Takahashi, Taro Ogawa, Hiromasa Yamanashi, Naoya Hirano

Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373372

KEYWORDS: Etching, Tantalum, Dry etching, Photomasks, Surface roughness, Extreme ultraviolet, Silicon, Atomic force microscopy, Multilayers, Optical properties

Read Abstract +

Proceedings Article | 19 July 1999 Paper

Paper

Future of optical lithography

Shinji Okazaki

Proceedings Volume 3749, (1999) https://doi.org/10.1117/12.354770

KEYWORDS: Optical lithography, Resolution enhancement technologies, Extreme ultraviolet lithography, Excimer lasers, Projection systems, Optical resolution, Light sources, Laser development, Electronics

Read Abstract +

Proceedings Article | 25 June 1999 Paper

Paper

EUV lithography research program at ASET

Shinji Okazaki

Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351095

KEYWORDS: Extreme ultraviolet lithography, Photomasks, Photoresist processing, Mirrors, Metrology, Optical lithography, Imaging systems, Lithography, EUV optics, Materials processing

Read Abstract +

Proceedings Article | 29 June 1998 Paper

Paper

Proposal of a composite phase-shifting mask for 0.15-um hole-pattern delineation using KrF exposure

Shinji Okazaki, Katsuya Hayano, Naoko Asai, Akira Imai, Norio Hasegawa

Proceedings Volume 3334, (1998) https://doi.org/10.1117/12.310781

KEYWORDS: Phase shifts, Composites, Photomasks, Chromium, Transmittance, Modulation, Halftones, Opacity, Quartz, Etching

Read Abstract +

Proceedings Article | 29 June 1998 Paper

Paper

Optimization of exposure procedures for sub-quarter-micron CMOS applications

Shoji Hotta, Keiko Fukumoto, Shinji Okazaki, Seiichiro Shirai, Toshihiko Onozuka

Proceedings Volume 3334, (1998) https://doi.org/10.1117/12.310790

KEYWORDS: Critical dimension metrology, Binary data, Phase shifts, Halftones, Photomasks, Photoresist processing, Optical lithography, Logic devices, Semiconducting wafers, Materials processing

Read Abstract +

Proceedings Article | 5 June 1998 Paper

Paper

Electron-beam direct writing technology for fine gate patterning

Hajime Hayakawa, Shinji Okazaki, Seiichiro Shirai, Kazuhiko Sato

Proceedings Volume 3331, (1998) https://doi.org/10.1117/12.309586

KEYWORDS: Lithography, CMOS devices, Electron beam lithography, Beam shaping, Transistors, Semiconducting wafers, Process control, Electron beams, Laser scattering, Scattering

Read Abstract +

SPIE Journal Paper | 1 October 1996

KrF excimer laser lithography with a phase-shifting mask for gigabit-scale ultra large scale integration

Akira Imai, Tsuneo Terasawa, Norio Hasegawa, Naoko Asai, Toshihiko Tanaka, Shinji Okazaki

OE, Vol. 35, Issue 10, (October 1996) https://doi.org/10.1117/12.10.1117/1.600980

KEYWORDS: Photomasks, Excimer lasers, Chromium, Lithography, Phase measurement, Phase shifts, Scanning electron microscopy, Optics manufacturing, Semiconducting wafers, Semiconductors

Proceedings Article | 7 June 1996 Paper

Paper

Wafer and chip deformation caused by pattern transfer

Norio Hasegawa, Akira Imai, Shinji Okazaki, Kouichi Sakaguchi

Proceedings Volume 2726, (1996) https://doi.org/10.1117/12.240975

KEYWORDS: Semiconducting wafers, Silicon, Photomasks, Finite element methods, Image registration, Manufacturing, Resolution enhancement technologies, Semiconductors, Overlay metrology, Photoresist processing

Read Abstract +

Proceedings Article | 3 July 1995 Paper

Paper

Phase-shifting masks for giga-scale ULSI

Shinji Okazaki, Norio Hasegawa, Naoko Asai, Akira Imai, Toshihiko Tanaka, Tsuneo Terasawa

Proceedings Volume 2512, (1995) https://doi.org/10.1117/12.212800

KEYWORDS: Photomasks, Excimer lasers, Chromium, Phase measurement, Lithography, Optical simulations, Phase shifts, Scanning electron microscopy, Optical lithography, Device simulation

Read Abstract +

Proceedings Article | 9 June 1995 Paper

Paper

Lithography for ULSI

Shinji Okazaki

Proceedings Volume 2438, (1995) https://doi.org/10.1117/12.210342

KEYWORDS: Lithography, Optical lithography, X-ray lithography, Super resolution, Electron beams, X-rays, Photomasks, Overlay metrology, Semiconducting wafers, Chemically amplified resists

Read Abstract +

Proceedings Article | 26 May 1995 Paper

Paper

Lithography for ULSI

Shinji Okazaki

Proceedings Volume 2440, (1995) https://doi.org/10.1117/12.209245

KEYWORDS: Lithography, Optical lithography, X-ray lithography, Super resolution, Electron beams, X-rays, Photomasks, Overlay metrology, Semiconducting wafers, Chemically amplified resists

Read Abstract +

Proceedings Article | 22 May 1995 Paper

Paper

Lithoraphy for ULSI

Shinji Okazaki

Proceedings Volume 2439, (1995) https://doi.org/10.1117/12.209196

KEYWORDS: Lithography, Optical lithography, X-ray lithography, Super resolution, X-rays, Electron beams, Photomasks, Overlay metrology, Semiconducting wafers, Chemically amplified resists

Read Abstract +

Proceedings Article | 19 May 1995 Paper

Paper

Lithography for ULSI

Shinji Okazaki

Proceedings Volume 2437, (1995) https://doi.org/10.1117/12.209152

KEYWORDS: Lithography, Optical lithography, X-ray lithography, Super resolution, Electron beams, X-rays, Photomasks, Overlay metrology, Semiconducting wafers, Chemically amplified resists

Read Abstract +

Proceedings Article | 1 August 1991 Paper

Paper

Investigation on the effect of electron-beam acceleration voltage and electron-beam sharpness on 0.2-um patterns

Akemi Moniwa, Shinji Okazaki

Proceedings Volume 1465, (1991) https://doi.org/10.1117/12.47352

KEYWORDS: Silicon, Monte Carlo methods, Electron beams, Photoresist processing, X-ray lithography, X-rays, Manufacturing, Ion beams, Optical simulations, Computer simulations

Read Abstract +

Proceedings Article | 1 June 1990 Paper

Paper

Phase-shifting mask and FLEX method for advanced photolithography

Hiroshi Fukuda, Akira Imai, Shinji Okazaki

Proceedings Volume 1264, (1990) https://doi.org/10.1117/12.20176

KEYWORDS: Phase shifts, Photoresist processing, Image processing, Optical lithography, Image quality, Excimer lasers, Image acquisition, Image resolution, Spatial frequencies, Photomasks

Read Abstract +

Showing 5 of 54 publications

Conference Committee Involvement (18)

International Conference on Extreme Ultraviolet Lithography 2024

29 September 2024 | Monterey, California, United States

International Conference on Extreme Ultraviolet Lithography 2023

2 October 2023 | Monterey, California, United States

International Conference on Extreme Ultraviolet Lithography 2022

26 September 2022 | Monterey, California, United States

International Conference on Extreme Ultraviolet Lithography 2021

27 September 2021 | Online Only, United States

Extreme Ultraviolet (EUV) Lithography XII

22 February 2021 | Online Only, California, United States

Extreme Ultraviolet (EUV) Lithography XI

24 February 2020 | San Jose, California, United States

Extreme Ultraviolet (EUV) Lithography X

25 February 2019 | San Jose, California, United States

Extreme Ultraviolet (EUV) Lithography IX

26 February 2018 | San Jose, California, United States

Extreme Ultraviolet (EUV) Lithography VIII

27 February 2017 | San Jose, California, United States

Extreme Ultraviolet (EUV) Lithography VII

22 February 2016 | San Jose, California, United States

Extreme Ultraviolet (EUV) Lithography VI

23 February 2015 | San Jose, California, United States

Extreme Ultraviolet (EUV) Lithography V

24 February 2014 | San Jose, California, United States

Extreme Ultraviolet (EUV) Lithography IV

25 February 2013 | San Jose, California, United States

Extreme Ultraviolet (EUV) Lithography III

13 February 2012 | San Jose, California, United States

Extreme Ultraviolet (EUV) Lithography II

28 February 2011 | San Jose, California, United States

Extreme Ultraviolet (EUV) Lithography

22 February 2010 | San Jose, California, United States

Alternative Lithographic Technologies

24 February 2009 | San Jose, California, United States

Emerging Lithographic Technologies XII

26 February 2008 | San Jose, California, United States

Showing 5 of 18 Conference Committees

SIGN IN TO:

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Advertisement

Advertisement