Mr. Takahito Kumazaki Profile

Takahito Kumazaki

at Gigaphoton Inc.

SPIE Involvement:

Author

Publications (29)

Proceedings Article | 10 April 2024 Poster

Analyzing line width roughness (LWR) sensitivity to resist and laser-induced speckle for enhanced PSD-based quantification

Takamitsu Komaki, Tomohiro Iwaki, Yuichi Mukai, Kouichi Fujii, Toshihiro Kobayashi, Toshihiro Ohga, Kouji Kakizaki, Takashi Saito, Risa Yasue, Natsuki Okada, Katsunori Otsuki, Tomonori Okada, Kanji Sugino, Takahito Kumazaki

Proceedings Volume PC12953, PC129530S (2024) https://doi.org/10.1117/12.3008944

KEYWORDS: Speckle, Line width roughness, Semiconductors, Scanners, Lithography, Light sources, Chromatic aberrations

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Proceedings Article | 23 February 2021 Poster + Presentation + Paper

Advanced spectral engineering: a new way of process improvements by laser spectra optimization for optical lithography

Koichi Fujii, Takahito Kumazaki, Takamitsu Komaki, Toshihiro Oga, Taku Yamazaki

Proceedings Volume 11613, 116130W (2021) https://doi.org/10.1117/12.2583670

KEYWORDS: Optical lithography, Laser processing, 3D image processing, Photoresist processing, Image processing, 3D image enhancement, Nanoimprint lithography, Lithography, Light sources, CMOS sensors

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Proceedings Article | 9 April 2020 Paper

Advanced spectral engineering: Lithography performance improvements by high performance light source

Kouichi Fujii, Takahito Kumazaki, Masakazu Hattori, Yosuke Fujimaki, Toshihiro Oga, Kouji Kakizaki, Junichi Fujimoto, Hakaru Mizoguchi

Proceedings Volume 11327, 1132712 (2020) https://doi.org/10.1117/12.2551966

KEYWORDS: Light sources, Lithography, Scanners, Electroluminescence, Semiconducting wafers, Copper indium disulfide, Projection systems, Chromatic aberrations, Optical lithography, Photomasks

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Proceedings Article | 20 November 2019 Paper

Laser-induced damage threshold by high pulse repetition rate ArF excimer laser radiation

Takahito Kumazaki, Daisuke Tei, Masakazu Hattori, Yousuke Fujimaki, Junichi Fujimoto, Hakaru Mizoguchi

Proceedings Volume 11173, 1117307 (2019) https://doi.org/10.1117/12.2536268

KEYWORDS: Excimer lasers, Laser applications, Pulsed laser operation, Light sources, Coating, Laser damage threshold, Laser development, Laser induced damage, Lithography, Semiconductors

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Proceedings Article | 16 November 2018 Presentation + Paper

Laser-induced damage and defect analysis of calcium fluoride window caused by the high pulse repetition rate of ArF excimer laser radiation

Daisuke Tei, Masakazu Hattori, Takahito Kumazaki, Yasutsugu Usami, Junichi Fujimoto, Hakaru Mizoguchi

Proceedings Volume 10805, 108050H (2018) https://doi.org/10.1117/12.2326657

KEYWORDS: Excimer lasers, Microscopes, Surface finishing, Crystals, Calcium, Digital image correlation, Atomic force microscopy, Optical components, Laser scattering, Laser induced damage

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Proceedings Article | 20 March 2018 Paper

Extremely long life excimer laser technology for multi-patterning lithography

Yousuke Fujimaki, Makoto Tanaka, Takashi Itou, Hirotaka Miyamoto, Miwa Igarashi, Hiroaki Tsushima, Takeshi Asayama, Takahito Kumazaki, Akihiko Kurosu, Takeshi Ohta, Satoru Bushida, Hakaru Mizoguchi

Proceedings Volume 10587, 105871J (2018) https://doi.org/10.1117/12.2297341

KEYWORDS: Electrodes, Excimer lasers, Lithography, Laser applications, Diffraction gratings

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Proceedings Article | 24 March 2017 Paper

Development of the next-generation ArF excimer laser with ultra-narrow stable spectral bandwidth for multiple patterning immersion lithography

Hiroshi Furusato, Takahito Kumazaki, Takeshi Ohta, Hiroaki Tsushima, Akihiko Kurosu, Takashi Matsunaga, Hakaru Mizoguchi

Proceedings Volume 10147, 101471N (2017) https://doi.org/10.1117/12.2257960

KEYWORDS: Helium, Actuators, Optical lithography, Excimer lasers, Immersion lithography, Yield improvement, Wavefronts, Critical dimension metrology, Refractive index, Nitrogen, Thermal effects, Diffraction gratings, Control systems

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Proceedings Article | 24 March 2017 Presentation + Paper

The ArF laser for the next generation multiple-patterning immersion lithography supporting green operations and leading edge processes

Hirotaka Miyamoto, Takahito Kumazaki, Hiroaki Tsushima, Akihiko Kurosu, Takeshi Ohta, Satoru Bushida, Takashi Matsunaga, Hakaru Mizoguchi

Proceedings Volume 10147, 1014719 (2017) https://doi.org/10.1117/12.2257959

KEYWORDS: Neon, Helium, Gases, Image processing, Nitrogen, Immersion lithography, Gas lasers, Image contrast enhancement, Image enhancement, Excimer lasers, Actuators, Wavefronts, Refractive index, Semiconducting wafers, Critical dimension metrology

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Multiple patterning ArF immersion lithography has been expected as the promising technology to meet tighter leading edge device requirements. The most needed features for the next generation lasers are improvement of device yield, the prevention against rare resource shortage and the reduction of operational costs in multiple-patterning lithography [1] [2]. To support these requirements, GT65A provides the functions of tighter E95 bandwidth stability, lower E95 bandwidth and tunable E95 bandwidth to enhance chip yields [3] [4]. Furthermore, in the prevention against rare resource shortage and the reduction of operational costs, GT65A realizes helium-free operation in a line narrowing module (LNM) and the reduction of neon consumption in a chamber [5]. A faster actuator equipped with the movable lens enables shot average of E95 bandwidth stability to be within ±5 fm to more rapidly adjust laser beam wavefront. More stable spectral bandwidth stability leads to improve CD uniformity. New designed LNM realizes 200 fm of lower E95 bandwidth, because it suppresses thermal wavefront deformation in optical elements and mechanical components. Lower E95 bandwidth improves image contrast and enhances exposure latitude. The combination of a faster actuator and new LNM enables tunable E95 bandwidth to vary from 200 to 450 fm at less than time intervals of a wafer lot exchange, six seconds. This enhances imaging margins by optimizing E95 bandwidth of light sources according to individual scanners. New LNM additionally enables helium-free operation to lower E95 bandwidth in spite of nitrogen purge with higher refractive index variation to temperature. The employment of a new LNM can avoid helium supply risk and saves helium consumption of 80 kL/year/unit. Gas recycling system saves by about 92% of neon consumption in ArF laser. Similarly, the recycling system saves about 85% of neon consumption in KrF laser too. These functions with GT65A improve chip yield and process margins, and support sustainable high volume manufacturing (HVM).

Proceedings Article | 15 March 2016 Paper

The next-generation ArF excimer laser for multiple-patterning immersion lithography with helium free operation

Hirotaka Miyamoto, Takahito Kumazaki, Hiroaki Tsushima, Akihiko Kurosu, Takeshi Ohta, Takashi Matsunaga, Hakaru Mizoguchi

Proceedings Volume 9780, 97801I (2016) https://doi.org/10.1117/12.2218778

KEYWORDS: Helium, Lithography, Excimer lasers, Immersion lithography, Optical lithography, Refractive index, Nitrogen, Wavefronts, Algorithm development, Deep ultraviolet, Diffraction gratings, Thermal effects, Optical components

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Proceedings Article | 15 March 2016 Paper

The ArF laser for the next-generation multiple-patterning immersion lithography supporting green operations

Keisuke Ishida, Takeshi Ohta, Hirotaka Miyamoto, Takahito Kumazaki, Hiroaki Tsushima, Akihiko Kurosu, Takashi Matsunaga, Hakaru Mizoguchi

Proceedings Volume 9780, 978010 (2016) https://doi.org/10.1117/12.2219379

KEYWORDS: Helium, Neon, Control systems, Laser development, Optical components, Immersion lithography, Excimer lasers, Optical lithography, Lithography, Gas lasers, Actuators, Semiconducting wafers, Laser applications

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Proceedings Article | 18 March 2015 Paper

120W ArF laser with high-wavelength stability and efficiency for the next-generation multiple-patterning immersion lithography

Takeshi Ohta, Keisuke Ishida, Takahito Kumazaki, Hiroaki Tsushima, Akihiko Kurosu, Kouji Kakizaki, Takashi Matsunaga, Hakaru Mizoguchi

Proceedings Volume 9426, 94261J (2015) https://doi.org/10.1117/12.2085631

KEYWORDS: Semiconducting wafers, Algorithm development, Lithography, Control systems, Laser development, Optical components, Laser stabilization, Gases, Helium, Immersion lithography

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Proceedings Article | 18 March 2015 Paper

Green solution: 120W ArF immersion light source supporting the next-generation multiple-pattering lithography

Takahito Kumazaki, Takeshi Ohta, Keisuke Ishida, Hiroaki Tsushima, Akihiko Kurosu, Kouji Kakizaki, Takashi Matsunaga, Hakaru Mizoguchi

Proceedings Volume 9426, 94261A (2015) https://doi.org/10.1117/12.2085006

KEYWORDS: Helium, Gas lasers, Lithography, Neon, Laser development, Semiconducting wafers, Laser applications, Light sources, Gases, Extreme ultraviolet lithography

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Proceedings Article | 4 April 2014 Paper

Extremely long life and low-cost 193nm excimer laser chamber technology for 450mm wafer multipatterning lithography

Hiroaki Tsushima, Hisakazu Katsuumi, Hiroyuki Ikeda, Takeshi Asayama, Takahito Kumazaki, Akihiko Kurosu, Takeshi Ohta, Kouji Kakizaki, Takashi Matsunaga, Hakaru Mizoguchi

Proceedings Volume 9052, 90521E (2014) https://doi.org/10.1117/12.2046189

KEYWORDS: Excimer lasers, Electrodes, 193nm lithography, Lithography, Laser applications, Light sources, Semiconducting wafers, Neodymium, Optical lithography, Semiconductors

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Proceedings Article | 31 March 2014 Paper

Technology for monitoring shot-level light source performance data to achieve high-optimization of lithography processes

Masato Moriya, Hideyuki Ochiai, Yoshinobu Watabe, Keisuke Ishida, Hiroyuki Masuda, Youichi Sasaki, Takahito Kumazaki, Akihiko Kurosu, Takeshi Ohta, Kouji Kakizaki, Takashi Matsunaga, Hakaru Mizoguchi

Proceedings Volume 9052, 90522E (2014) https://doi.org/10.1117/12.2046128

KEYWORDS: Light sources, Semiconducting wafers, Beam propagation method, Sensors, Polarization, Data acquisition, Lithography, Infrared sensors, Metrology, Liquid crystal lasers

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Proceedings Article | 12 April 2013 Paper

Power up: 120 Watt injection-locked ArF excimer laser required for both multi-patterning and 450 mm wafer lithography

Takeshi Asayama, Youichi Sasaki, Takayuki Nagashima, Akihiko Kurosu, Hiroaki Tsushima, Takahito Kumazaki, Kouji Kakizaki, Takashi Matsunaga, Hakaru Mizoguchi

Proceedings Volume 8683, 86831G (2013) https://doi.org/10.1117/12.2011404

KEYWORDS: Excimer lasers, Lithography, Light sources, 193nm lithography, Semiconducting wafers, Laser stabilization, Laser systems engineering, Pulsed laser operation, High power lasers, Extreme ultraviolet

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Proceedings Article | 13 March 2012 Paper

A reliable higher power ArF laser with advanced functionality for immersion lithography

Akihiko Kurosu, Masaki Nakano, Masanori Yashiro, Masaya Yoshino, Hiroaki Tsushima, Hiroyuki Masuda, Takahito Kumazaki, Shinichi Matsumoto, Kouji Kakizaki, Takashi Matsunaga, Shinji Okazaki, Junichi Fujimoto, Hakaru Mizoguchi

Proceedings Volume 8326, 83261F (2012) https://doi.org/10.1117/12.916324

KEYWORDS: Excimer lasers, Control systems, Optical lithography, Laser drilling, Gas lasers, Laser development, Semiconducting wafers, Gemini Planet Imager, 193nm lithography, Manufacturing

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Proceedings Article | 22 September 2011 Paper

High-range laser bandwidth tuning for focus drilling

Alena Andryzhyieuskaya, John van Keulen, Tom van der Hoeff, Jeroen J. H. Linders, Michiel Kupers, Pablo Gabolde, Bart Smits, Takahito Kumazaki, Satoshi Tanaka, Hiroshi Tanaka, Junichi Fujimoto

Proceedings Volume 8167, 81671X (2011) https://doi.org/10.1117/12.898556

KEYWORDS: Semiconducting wafers, Laser drilling, Lithography, Fabry–Perot interferometers, Overlay metrology, Optical lithography, Extreme ultraviolet, Laser stabilization, Light sources, Scanners

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Proceedings Article | 16 March 2009 Paper

Reliability report of high power injection lock laser light source for double exposure and double patterning ArF immersion lithography

Hiroaki Tsushima, Masaya Yoshino, Takeshi Ohta, Takahito Kumazaki, Hidenori Watanabe, Shinichi Matsumoto, Hiroaki Nakarai, Hiroshi Umeda, Yasufumi Kawasuji, Toru Suzuki, Satoshi Tanaka, Akihiko Kurosu, Takashi Matsunaga, Junichi Fujimoto, Hakaru Mizoguchi

Proceedings Volume 7274, 72743L (2009) https://doi.org/10.1117/12.813642

KEYWORDS: Reliability, Oscillators, Light sources, Fluorine, Laser applications, Double patterning technology, Optical amplifiers, High power lasers, Excimer lasers, Immersion lithography

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Proceedings Article | 16 March 2009 Paper

Optical performance of laser light source for ArF immersion double patterning lithography tool

Katsuhiko Wakana, Hiroaki Tsushima, Shinichi Matsumoto, Masaya Yoshino, Takahito Kumazaki, Hidenori Watanabe, Takeshi Ohta, Satoshi Tanaka, Toru Suzuki, Hiroaki Nakarai, Yasufumi Kawasuji, Akihiko Kurosu, Takashi Matsunaga, Junichi Fujimoto, Hakaru Mizoguchi

Proceedings Volume 7274, 72743J (2009) https://doi.org/10.1117/12.813476

KEYWORDS: Lithography, Light sources, Double patterning technology, Laser optics, Line edge roughness, Spatial coherence, Speckle, Temporal coherence, Immersion lithography, Critical dimension metrology

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Proceedings Article | 7 March 2008 Paper

Reliable high power injection locked 6 kHz 60W laser for ArF immersion lithography

Takahito Kumazaki, Toru Suzuki, Satoshi Tanaka, Ryoichi Nohdomi, Masaya Yoshino, Shinichi Matsumoto, Yasufumi Kawasuji, Hiroshi Umeda, Hitoshi Nagano, Kouji Kakizaki, Hiroaki Nakarai, Takashi Matsunaga, Junichi Fujimoto, Hakaru Mizoguchi

Proceedings Volume 6924, 69242R (2008) https://doi.org/10.1117/12.778149

KEYWORDS: Semiconducting wafers, Reliability, Immersion lithography, Light sources, Laser stabilization, Metrology, High power lasers, Spectroscopy, Laser development, Laser applications

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Proceedings Article | 26 March 2007 Paper

Ultra line narrowed injection lock laser light source for higher NA ArF immersion lithography tool

Toru Suzuki, Kouji Kakizaki, Takashi Matsunaga, Satoshi Tanaka, Yasufumi Kawasuji, Masashi Shimbori, Masaya Yoshino, Takahito Kumazaki, Hiroshi Umeda, Hitoshi Nagano, Shinji Nagai, Youichi Sasaki, Hakaru Mizoguchi

Proceedings Volume 6520, 652024 (2007) https://doi.org/10.1117/12.711366

KEYWORDS: Light sources, Spectroscopy, Immersion lithography, Optical proximity correction, Excimer lasers, Lithography, Scanners, Laser applications, Laser development, Critical dimension metrology

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Proceedings Article | 28 May 2004 Paper

Development of high-power ArF/F2 laser platform for VUV microlithography

Kouji Kakizaki, Junichi Fujimoto, Taku Yamazaki, Toru Suzuki, Takashi Matsunaga, Yasufumi Kawasuji, Yukio Watanabe, Masashi Kaminishi, Toyoharu Inoue, Hakaru Mizoguchi, Takahito Kumazaki, Tatsuya Ariga, Takayuki Watanabe, Takayuki Yabu, Koutarou Sasano, Tsukasa Hori, Osamu Wakabayashi, Akira Sumitani

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.536846

KEYWORDS: High power lasers, Optical lithography, Vacuum ultraviolet, Mirrors, Lithography, Reliability, Light sources, Magnetism, Laser development

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Proceedings Article | 28 May 2004 Paper

Beam quality of a new-type MOPO laser system for VUV laser lithography

Osamu Wakabayashi, Tatsuya Ariga, Takahito Kumazaki, Koutarou Sasano, Takayuki Watanabe, Takayuki Yabu, Tsukasa Hori, Kouji Kakizaki, Akira Sumitani, Hakaru Mizoguchi

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.536241

KEYWORDS: Spatial coherence, Fabry–Perot interferometers, Spectroscopy, Laser systems engineering, Lithography, Vacuum ultraviolet, Oscillators, Interferometers, Mirrors, Visibility

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ArF-dry microlithography is currently switching from pre-production to mass-production and the target node is shifted from 90 nm to 65 nm. ArF-wet or F₂ laser lithography will then be an important player for the next generation node below 45 nm. Therefore, high throughput and high-resolution exposure tools for VUV lithography require VUV light sources (ArF and F₂ lasers) with high power and narrow bandwidth. In this paper, we describe the beam quality of the new- type injection lock (MOPO, master oscillator power oscillator) ArF laser system we developed and compare it with the beam quality of a master oscillator power amplifier (MOPA) ArF laser system. A high power and narrow bandwidth ArF laser can be achieved with twin laser chambers in a MOPA or an injection lock laser configuration. Compared to the MOPA system, the injection lock laser system has an excellent performance (e.g. high efficiency, long pulse duration and narrow spectrum). On the other hand, the injection lock system has some disadvantages in beam quality showing high spatial coherence, broadband emission and having a beam profile with a hole. These technical issues have been solved, however, with the following two new breakthrough-technologies: (1) a new-type injection lock system having low spatial coherence and a beam profile with no hole and (2) the optimization of the injection seed energy and discharge timing between the twin chambers for low broadband emission. The spatial coherence, the broadband spectrum and the beam profile of the new-type injection lock system were measured with a Young’s interferometer, a wide range spectrometer with etalons and a 2-dimensional beam profiler, respectively. The new-type injection lock ArF laser system had a lower spatial coherence than a conventional injection lock system, a very low broadband emission level thus preventing deterioration of exposure tools resolution, and a beam profile with no hole. Moreover, we reconfirmed that the new-type injection lock system has the same excellent performance as the conventional injection lock system.

Proceedings Article | 26 June 2003 Paper

Spectral dynamics analysis of utlra-line-narrowed F2 laser

Takahito Kumazaki, Osamu Wakabayashi, Ryoichi Nohdomi, Tatsuya Ariga, Hidenori Watanabe, Kazuaki Hotta, Hakaru Mizoguchi, Hiroki Tanaka, Akihiko Takahashi, Tatsuo Okada

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485381

KEYWORDS: Pulsed laser operation, Oscillators, Optical simulations, Laser systems engineering, Laser development, Amplifiers, Numerical simulations, Optical amplifiers, Resonators, Luminescence

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Proceedings Article | 30 July 2002 Paper

Spectral metrologies for ultra-line-narrowed F2 laser

Takanori Nakaike, Osamu Wakabayashi, Toru Suzuki, Hakaru Mizoguchi, Kiyoharu Nakao, Ryoichi Nohdomi, Tatsuya Ariga, Naoki Kitatochi, Takashi Suganuma, Takahito Kumazaki, Kazuaki Hotta, Masaki Yoshioka

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474560

KEYWORDS: Spectroscopy, Vacuum ultraviolet, Laser development, Calibration, Refractor telescopes, Metrology, Light sources, Laser systems engineering, Oscillators, Optical lithography

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Proceedings Article | 30 July 2002 Paper

Development of a 5-kHz ultra-line-narrowed F2 laser for dioptric projection systems

Tatsuya Ariga, Hidenori Watanabe, Takahito Kumazaki, Naoki Kitatochi, Kotaro Sasano, Yoshifumi Ueno, Masayuki Konishi, Takashi Suganuma, Masaki Nakano, Toshio Yamashita, Toshihiro Nishisaka, Ryoichi Nohdomi, Kazuaki Hotta, Hakaru Mizoguchi, Kiyoharu Nakao

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474613

KEYWORDS: Oscillators, Pulsed laser operation, Amplifiers, Refractor telescopes, Laser development, Laser systems engineering, Projection systems, Laser stabilization, Spectroscopy, Mirrors

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Proceedings Article | 25 February 2002 Paper

Ultra-line-narrowed F2 laser for microlithography

Hiroshi Komori, Tatsuya Ariga, Hidenori Watanabe, Takahito Kumazaki, Naoki Kitatochi, Kotaro Sasano, Yoshifumi Ueno, Toshihiro Nishisaka, Ryoichi Nohdomi, Kazuaki Hotta, Hakaru Mizoguchi, Kiyoharu Nakao

Proceedings Volume 4426, (2002) https://doi.org/10.1117/12.456815

KEYWORDS: Oscillators, Laser development, Pulsed laser operation, Optical amplifiers, Laser systems engineering, Laser applications, Optical lithography, Lithography, Amplifiers, Refractor telescopes

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Proceedings Article | 14 September 2001 Paper

Spectral measurement of ultra line-narrowed F2 laser

Osamu Wakabayashi, Jun Sakuma, Toru Suzuki, Hirokazu Kubo, Naoki Kitatochi, Takashi Suganuma, Takanori Nakaike, Takahito Kumazaki, Kazuaki Hotta, Hakaru Mizoguchi, Kiyoharu Nakao, Tadashi Togashi, Yasuo Nabekawa, Shuntaro Watanabe

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435638

KEYWORDS: Spectroscopy, Vacuum ultraviolet, Light sources, Laser development, Michelson interferometers, Calibration, Xenon, Spectral calibration, Excimer lasers, Sapphire lasers

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Proceedings Article | 14 September 2001 Paper

Challenge of the F2 laser for dioptric projection system

Tatsuya Ariga, Hidenori Watanabe, Takahito Kumazaki, Naoki Kitatochi, Kotaro Sasano, Yoshifumi Ueno, Toshihiro Nishisaka, Ryoichi Nohdomi, Kazuaki Hotta, Hakaru Mizoguchi, Kiyoharu Nakao

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435650

KEYWORDS: Oscillators, Optical amplifiers, Amplifiers, Refractor telescopes, Laser systems engineering, Laser development, Pulsed laser operation, Optical lithography, Projection systems, Combined lens-mirror systems

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