Alternative high-resolution lithographic technologies for optical applications

Uwe D. Zeitner; Tina Weichelt; Yannick Bourgin; Robert Kinder

doi:10.1117/12.2222028

15 March 2016 Alternative high-resolution lithographic technologies for optical applications

Uwe D. Zeitner, Tina Weichelt, Yannick Bourgin, Robert Kinder

Proceedings Volume 9780, Optical Microlithography XXIX; 97800R (2016) https://doi.org/10.1117/12.2222028
Event: SPIE Advanced Lithography, 2016, San Jose, California, United States

Abstract

Modern optical applications have special demands on the lithographic fabrication technologies. This relates to the lateral shape of the structures as well as to their three dimensional surface profile. On the other hand optical nano-structures are often periodic which allows for the use of dedicated lithographic exposure principles. The paper briefly reviews actual developments in the field of optical nano-structure generation. Special emphasis will be given to two technologies: electron-beam lithography based on a flexible cell-projection method and the actual developments in diffractive mask aligner lithography. Both offer a cost effective fabrication alternative for high resolution structures or three-dimensional optical surface profiles.

Citation Download Citation

Uwe D. Zeitner, Tina Weichelt, Yannick Bourgin, and Robert Kinder "Alternative high-resolution lithographic technologies for optical applications", Proc. SPIE 9780, Optical Microlithography XXIX, 97800R (15 March 2016); https://doi.org/10.1117/12.2222028

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