LDP EUV source performance and cost-of-ownership improvement

Yusuke Teramoto; Shunichi Morimoto; Teruaki Kawajiri; Koji Suzuki; Fuki Sato; Akihisa Nagano; Noritaka Ashizawa; Hidenori Watanabe; Kazuya Aoki; Yoshihiko Sato

doi:10.1117/12.3036726

13 November 2024 LDP EUV source performance and cost-of-ownership improvement

Yusuke Teramoto, Shunichi Morimoto, Teruaki Kawajiri, Koji Suzuki, Fuki Sato, Akihisa Nagano, Noritaka Ashizawa, Hidenori Watanabe, Kazuya Aoki, Yoshihiko Sato

Author Affiliations +

Proceedings Volume PC13215, International Conference on Extreme Ultraviolet Lithography 2024; PC1321514 (2024) https://doi.org/10.1117/12.3036726
Event: SPIE Photomask Technology + EUV Lithography, 2024, Monterey, California, United States

Conference Poster

Abstract

Ushio's LDP (Laser-assisted Discharge-produced Plasma) EUV source is a plasma EUV source utilizing rotating electrodes, circulating liquid tin, repetitive pulsed high-current discharge up to 10 kHz (15 kW), trigger lasers, and a debris filter to protect the optics from the tin debris emitted from the plasma [1]. The LDP EUV source can offer excellent light performance [2-3] for various applications in the semiconductor manufacturing ecosystems and has been used for Actinic Patterned Mask Inspection (APMI) [4] and beamline applications. Ushio is dedicated to continuous development, particularly performance, reliability and cost-of-ownership (CoO). Our research involved a series of experiments to measure the brightness, power, stability, and fast ions under various discharge conditions. We also implemented a more effective design to the debris filter. Data indicate that this modification will double the collector lifetime without compromising optical transmission. As a result of quality and robustness enhancements of the modules, the source MTBM has reached five weeks and is approaching six weeks in the field.

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Yusuke Teramoto, Shunichi Morimoto, Teruaki Kawajiri, Koji Suzuki, Fuki Sato, Akihisa Nagano, Noritaka Ashizawa, Hidenori Watanabe, Kazuya Aoki, and Yoshihiko Sato "LDP EUV source performance and cost-of-ownership improvement", Proc. SPIE PC13215, International Conference on Extreme Ultraviolet Lithography 2024, PC1321514 (13 November 2024); https://doi.org/10.1117/12.3036726

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