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5 August 2013 Digital pattern generator: an electron-optical MEMS for massively parallel reflective electron beam lithography
Luca Grella, Allen Carroll, Kirk Murray, Mark A. McCord, William M. Tong, Alan D. Brodie, Thomas Gubiotti, Fuge Sun, Francoise Kidwingira, Shinichi Kojima, Paul Petric, Christopher F. Bevis, Bart Vereecke, Luc Haspeslagh, Anil Mane, Jeffrey W. Elam
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Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 12, Issue 3, 031107 (August 2013). https://doi.org/10.1117/1.JMM.12.3.031107
Abstract
The digital pattern generator (DPG) is a complex electron-optical MEMS that pixelates the electron beam in the reflective electron beam lithography (REBL) e-beam column. It potentially enables massively parallel printing, which could make REBL competitive with optical lithography. The development of the REBL DPG, from the CMOS architecture, through the lenslet modeling and design, to the fabrication of the MEMS device, is described in detail. The imaging and printing results are also shown, which validate the pentode lenslet concept and the fabrication process.
CC BY: © The Authors. Published by SPIE under a Creative Commons Attribution 4.0 Unported License. Distribution or reproduction of this work in whole or in part requires full attribution of the original publication, including its DOI.
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Luca Grella, Allen Carroll, Kirk Murray, Mark A. McCord, William M. Tong, Alan D. Brodie, Thomas Gubiotti, Fuge Sun, Francoise Kidwingira, Shinichi Kojima, Paul Petric, Christopher F. Bevis, Bart Vereecke, Luc Haspeslagh, Anil Mane, and Jeffrey W. Elam "Digital pattern generator: an electron-optical MEMS for massively parallel reflective electron beam lithography," Journal of Micro/Nanolithography, MEMS, and MOEMS 12(3), 031107 (5 August 2013). https://doi.org/10.1117/1.JMM.12.3.031107
Published: 5 August 2013
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Cited by 5 scholarly publications and 4 patents.
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KEYWORDS
Electrodes
Mirrors
Microelectromechanical systems
Semiconducting wafers
Tin
Electron beam lithography
Metals
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