Mr. Ahmad H. Elayat Profile

Ahmad H. Elayat

at Siemens EDA

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Author

Publications (4)

Proceedings Article | 28 June 2013 Paper

Using pattern shift to avoid blank defects during EUVL mask fabrication

Yoshiyuki Negishi, Yuki Fujita, Kazunori Seki, Toshio Konishi, Jed Rankin, Steven Nash, Emily Gallagher, Alfred Wagner, Peter Thwaite, Ahmad Elayat

Proceedings Volume 8701, 870112 (2013) https://doi.org/10.1117/12.2030765

KEYWORDS: Extreme ultraviolet lithography, Inspection, Metals, Extreme ultraviolet, Photomasks, Lithography, Tantalum, Mask making, Visualization, Computer simulations

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Proceedings Article | 8 November 2012 Paper

EUV mask blank defect avoidance solutions assessment

Ahmad Elayat, Peter Thwaite, Steffen Schulze

Proceedings Volume 8522, 85221W (2012) https://doi.org/10.1117/12.979154

KEYWORDS: Photomasks, Extreme ultraviolet, Manufacturing, Reticles, Semiconducting wafers, Inspection, Databases, Optical proximity correction, Extreme ultraviolet lithography, Software development

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Proceedings Article | 17 April 2012 Paper

Mask write time reduction: deployment of advanced approaches and their impact on established work models

S. Schulze, A. Elayat, T. Lin, E. Sahouria

Proceedings Volume 8352, 83520J (2012) https://doi.org/10.1117/12.923675

KEYWORDS: Photomasks, Optical proximity correction, Lithography, Inspection, Semiconducting wafers, Manufacturing, Model-based design, Data processing, Resolution enhancement technologies, Forward error correction

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Proceedings Article | 14 October 2011 Paper

Assessment and comparison of different approaches for mask write time reduction

A. Elayat, T. Lin, E. Sahouria, S. Schulze

Proceedings Volume 8166, 816634 (2011) https://doi.org/10.1117/12.902443

KEYWORDS: Photomasks, Optical proximity correction, Data modeling, Inspection, Manufacturing, Semiconducting wafers, Optical alignment, Lithography, Model-based design, Forward error correction

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