Mr. Emile Sahouria Profile

Emile Sahouria

Engineer at Mentor, a Siemens Business

SPIE Involvement:

Author

Publications (33)

Proceedings Article | 17 April 2012 Paper

Mask write time reduction: deployment of advanced approaches and their impact on established work models

S. Schulze, A. Elayat, T. Lin, E. Sahouria

Proceedings Volume 8352, 83520J (2012) https://doi.org/10.1117/12.923675

KEYWORDS: Photomasks, Optical proximity correction, Lithography, Inspection, Semiconducting wafers, Manufacturing, Model-based design, Data processing, Resolution enhancement technologies, Forward error correction

Read Abstract +

Proceedings Article | 14 October 2011 Paper

Assessment and comparison of different approaches for mask write time reduction

A. Elayat, T. Lin, E. Sahouria, S. Schulze

Proceedings Volume 8166, 816634 (2011) https://doi.org/10.1117/12.902443

KEYWORDS: Photomasks, Optical proximity correction, Data modeling, Inspection, Manufacturing, Semiconducting wafers, Optical alignment, Lithography, Model-based design, Forward error correction

Read Abstract +

Proceedings Article | 14 October 2011 Paper

Reducing shot count through optimization-based fracture

Timothy Lin, Emile Sahouria, Nataraj Akkiraju, Steffen Schulze

Proceedings Volume 8166, 81660T (2011) https://doi.org/10.1117/12.897779

KEYWORDS: Photomasks, Semiconducting wafers, Lithography, Photovoltaics, Resolution enhancement technologies, Optical proximity correction, Optimization (mathematics), Manufacturing, SRAF, Wafer-level optics

Read Abstract +

Proceedings Article | 2 April 2011 Paper

Multiresolution mask writing

Emile Sahouria

Proceedings Volume 7985, 798503 (2011) https://doi.org/10.1117/12.881929

KEYWORDS: Image processing, Photomasks, Manufacturing, Image quality, Etching, Metals, Computer simulations, Electron beam lithography, Lithography, Detection and tracking algorithms

Read Abstract +

Proceedings Article | 25 September 2010 Paper

Generalization of shot definition for variable shaped e-beam machines for write time reduction

Emile Sahouria, Amanda Bowhill

Proceedings Volume 7823, 78230T (2010) https://doi.org/10.1117/12.867994

KEYWORDS: Photomasks, Beam shaping, Manufacturing, Mask making, Optical proximity correction, Source mask optimization, Visualization, Image enhancement, Metals, Computer simulations

Read Abstract +

Proceedings Article | 23 September 2009 Paper

Deployment of OASIS.MASK (P44) as direct input for mask inspection of advanced photomasks

Suheil Zaatri, Yan Liu, Michael Asturias, Joan McCall, Wei-Guo Lei, Tsafi Lapidot, Khen Ofek, Aviram Tam, Mark Wagner, Amanda Bowhill, Emile Sahouria, Minyoung Park, Neil DeBella, Pradiptya Ghosh, Steffen Schulze

Proceedings Volume 7488, 748823 (2009) https://doi.org/10.1117/12.833443

KEYWORDS: Inspection, Photomasks, Metrology, Vestigial sideband modulation, Data conversion, Data processing, Manufacturing, Standards development, Semiconducting wafers, Computer simulations

Read Abstract +

Proceedings Article | 17 October 2008 Paper

Double-patterning decomposition, design compliance, and verification algorithms at 32nm hp

Alexander Tritchkov, Petr Glotov, Sergiy Komirenko, Emile Sahouria, Andres Torres, Ahmed Seoud, Vincent Wiaux

Proceedings Volume 7122, 71220S (2008) https://doi.org/10.1117/12.801381

KEYWORDS: Double patterning technology, Photomasks, Resolution enhancement technologies, Optical proximity correction, Optical lithography, Logic, Photoresist processing, Etching, Computer aided design, Silicon

Read Abstract +

Proceedings Article | 17 October 2008 Paper

Compute resource management and turn around time control in mask data prep

Travis Lewis, Scott Goad, Kenneth Jantzen, Ahmed Nouh, Minyoung Park, Emile Sahouria, Steffen Schulze

Proceedings Volume 7122, 71222O (2008) https://doi.org/10.1117/12.801544

KEYWORDS: Databases, Optical proximity correction, Data centers, Metals, Photomasks, Control systems, Data processing, Resolution enhancement technologies, Optical components, Optical resolution

Read Abstract +

Proceedings Article | 19 May 2008 Paper

Mask shot count reduction strategies in the OPC flow

James Word, Keisuke Mizuuchi, Sai Fu, William Brown, Emile Sahouria

Proceedings Volume 7028, 70283F (2008) https://doi.org/10.1117/12.799410

KEYWORDS: Optical proximity correction, Photomasks, Metals, Resolution enhancement technologies, Visualization, Tolerancing, Design for manufacturing, Cadmium, Inspection, Data processing

Read Abstract +

Proceedings Article | 7 March 2008 Paper

Advanced mask process modeling for 45-nm and 32-nm nodes

Edita Tejnil, Yuanfang Hu, Emile Sahouria, Steffen Schulze, Ming Jing Tian, Eric Guo

Proceedings Volume 6924, 69243H (2008) https://doi.org/10.1117/12.772975

KEYWORDS: Data modeling, Photomasks, Calibration, Etching, Process modeling, Critical dimension metrology, Photoresist processing, Electron beam lithography, Cadmium, Lithography

Read Abstract +

Proceedings Article | 16 November 2007 Paper

Reduction of layout complexity for shorter mask write-time

Sean Hannon, Travis Lewis, Scott Goad, Kenneth Jantzen, Jianlin Wang, Hien Vu, Emile Sahouria, Steffen Schulze

Proceedings Volume 6730, 67303K (2007) https://doi.org/10.1117/12.746986

KEYWORDS: Source mask optimization, Photomasks, Optical proximity correction, Reticles, Manufacturing, Optical alignment, Tolerancing, Lithography, Data processing, Semiconducting wafers

Read Abstract +

Proceedings Article | 1 November 2007 Paper

A user-programmable link between data preparation and mask manufacturing equipment

Weidong Zhang, Grant Davis, Emile Sahouria, Steffen Schulze, Mohammed Saad, Arne Seyfarth, Eric Poortinga

Proceedings Volume 6730, 67304H (2007) https://doi.org/10.1117/12.746988

KEYWORDS: Metrology, Photomasks, Computer programming, Manufacturing, Interfaces, Manufacturing equipment, Databases, Visualization, Optical proximity correction, Data modeling

Read Abstract +

Proceedings Article | 30 October 2007 Paper

Improving the CD linearity and proximity performance of photomasks written on the Sigma7500-II DUV laser writer through embedded OPC

Anders Österberg, Lars Ivansen, Angela Beyerl, Tom Newman, Amanda Bowhill, Emile Sahouria, Steffen Schulze

Proceedings Volume 6730, 673034 (2007) https://doi.org/10.1117/12.747074

KEYWORDS: Photomasks, Optical proximity correction, Semiconducting wafers, Calibration, Deep ultraviolet, Spatial light modulators, Lithography, Systems modeling, Model-based design, Acquisition tracking and pointing

Read Abstract +

Proceedings Article | 11 May 2007 Paper

Embedded optical proximity correction for the Sigma7500 DUV mask writer

Anders Österberg, Lars Ivansen, Henrik Åhlfeldt, Hans Fosshaug, Tom Newman, Amanda Bowhill, Emile Sahouria, Steffen Schulze

Proceedings Volume 6607, 660704 (2007) https://doi.org/10.1117/12.728918

KEYWORDS: Photomasks, Optical proximity correction, Calibration, Semiconducting wafers, Deep ultraviolet, Systems modeling, Spatial light modulators, Matrices, Model-based design, Lithography

Read Abstract +

Proceedings Article | 20 October 2006 Paper

Distributed computing in mask data preparation for 45-nm node and below

Weidong Zhang, Emile Sahouria, Steffen Schulze

Proceedings Volume 6349, 63493T (2006) https://doi.org/10.1117/12.685144

KEYWORDS: Distributed computing, Process control, Photomasks, Computing systems, Data processing, Parallel processing, Databases, Manufacturing, Optical proximity correction, Signal processing

Read Abstract +

Proceedings Article | 28 June 2005 Paper

Pattern based mask process correction: impact on data quality and mask writing time

Emile Sahouria, Amanda Bowhill, Steffen Schulze

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617133

KEYWORDS: Photomasks, Data corrections, Manufacturing, Convolution, Semiconducting wafers, Mask making, Optical proximity correction, Critical dimension metrology, Tolerancing, Etching

Read Abstract +

Proceedings Article | 16 June 2005 Paper

Extending OASIS for the unification of mask data representation

Emile Sahouria, Steffen Schulze, Toshio Suzuki, Junji Hirumi

Proceedings Volume 5835, (2005) https://doi.org/10.1117/12.637283

KEYWORDS: Photomasks, Manufacturing, Data conversion, Resolution enhancement technologies, Vestigial sideband modulation, Standards development, Mask making, Inspection equipment, Inspection, Integrated circuits

Read Abstract +

Proceedings Article | 5 May 2005 Paper

The prospects for hierarchical data processing with growing complexity of the post-tapeout flow

Steffen Schulze, Emile Sahouria

Proceedings Volume 5756, (2005) https://doi.org/10.1117/12.600659

KEYWORDS: Photomasks, Manufacturing, Data corrections, Data processing, Mask making, Lithography, Semiconducting wafers, Wafer manufacturing, Etching, Convolution

Read Abstract +

Proceedings Article | 6 December 2004 Paper

Full-chip model-based correction of flare-induced linewidth variation

James Word, Jerome Belledent, Yorick Trouiller, Wilhelm Maurer, Yuri Granik, Emile Sahouria, Olivier Toublan

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569175

KEYWORDS: Optical proximity correction, Point spread functions, Convolution, Data modeling, Light scattering, Critical dimension metrology, SRAF, Databases, Optical lithography, Process modeling

Read Abstract +

Proceedings Article | 20 August 2004 Paper

OASIS-based unification of mask data representation

Emile Sahouria, Steffen Schulze

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557740

KEYWORDS: Photomasks, Data conversion, Manufacturing, Resolution enhancement technologies, Vestigial sideband modulation, Integrated circuits, Mask making, Beam shaping, Transform theory, Inspection

Read Abstract +

Proceedings Article | 17 December 2003 Paper

Parallel processing approaches in RET and MDP: new hybrid multithreading and distributed technology for optimum throughput in a hierarchical flow

Steffen Schulze, Emile Sahouria, Robert Todd, Laurence Grodd, Mary Finch

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518230

KEYWORDS: Resolution enhancement technologies, Parallel processing, Photomasks, Computer networks, Data processing, Manufacturing, Distributed computing, Visualization, Databases, Data storage

Read Abstract +

Proceedings Article | 28 August 2003 Paper

High-performance fracturing for variable shaped beam mask writing machines

Steffen Schulze, Emile Sahouria, Eugene Miloslavsky

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504274

KEYWORDS: Photomasks, Manufacturing, Resolution enhancement technologies, Optical proximity correction, Beam shaping, Vestigial sideband modulation, Data conversion, Optics manufacturing, Detection and tracking algorithms, Lithography

Read Abstract +

Proceedings Article | 30 July 2002 Paper

Model-based OPC considering process window aspects: a study

Steffen Schulze, O'Seo Park, Rainer Zimmermann, Ming-Jui Chen, Pat LaCour, Emile Sahouria, Yuri Granik, Nicolas Cobb

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474489

KEYWORDS: Optical proximity correction, Image processing, Process modeling, Lithography, Model-based design, Visualization, Resolution enhancement technologies, Phase shifting, Photomasks, Detection and tracking algorithms

Read Abstract +

Proceedings Article | 12 July 2002 Paper

Chip-level line-width prediction methodology

Pat LaCour, Emile Sahouria, Yuri Granik

Proceedings Volume 4692, (2002) https://doi.org/10.1117/12.475669

KEYWORDS: SRAF, Critical dimension metrology, Resolution enhancement technologies, Calibration, Data modeling, Optical proximity correction, Performance modeling, Manufacturing, Computer aided design, Metals

Read Abstract +

Proceedings Article | 11 March 2002 Paper

Hierarchical GDSII-based fracturing and job deck system

Nicolas Cobb, Emile Sahouria

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458356

KEYWORDS: Medium wave, Data conversion, Electronic design automation, Visualization, Optical proximity correction, Data storage, Inspection, Databases, Standards development, Resolution enhancement technologies

Read Abstract +

Proceedings Article | 14 September 2001 Paper

Fully automatic side lobe detection and correction technique for attenuated phase-shift masks

Olivier Toublan, Nicolas Cobb, Emile Sahouria

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435696

KEYWORDS: Optical proximity correction, Photomasks, Printing, Metals, Image processing, Manufacturing, Visualization, Scattering, Lithography, Model-based design

Read Abstract +

Proceedings Article | 22 January 2001 Paper

Phase and transmission errors aware OPC solution for PSM: feasability demonstration

Olivier Toublan, Emile Sahouria, Nicolas Cobb

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410769

KEYWORDS: Photomasks, Etching, Optical proximity correction, Phase shifts, Quartz, Semiconducting wafers, Electromagnetism, Device simulation, Printing, Panoramic photography

Read Abstract +

Proceedings Article | 22 January 2001 Paper

CD variation analysis technique and its application to the study of PSM mask misalignment

Yuri Granik, Nicolas Cobb, Emile Sahouria

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410768

KEYWORDS: Binary data, Critical dimension metrology, Optical proximity correction, Photomasks, Statistical analysis, Diffractive optical elements, Lithography, Phase shifts, Logic, Model-based design

Read Abstract +

Proceedings Article | 23 August 2000 Paper

Subresolution process windows and yield estimation technique based on detailed full-chip CD simulation

Yuri Granik, Nicolas Cobb, Emile Sahouria, Olivier Toublan, Luigi Capodieci, Robert Socha

Proceedings Volume 4182, (2000) https://doi.org/10.1117/12.410096

KEYWORDS: Critical dimension metrology, Binary data, Optical proximity correction, Cadmium, Statistical analysis, Photomasks, Phase shifts, Lithography, Visualization, Very large scale integration

Read Abstract +

Proceedings Article | 19 July 2000 Paper

Integration of optical proximity correction strategies in strong phase-shifter design for polygate layers

Chris Spence, Marina Plat, Emile Sahouria, Nicolas Cobb, Franklin Schellenberg

Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392102

KEYWORDS: Optical proximity correction, Photomasks, Model-based design, Semiconducting wafers, Phase shifts, Distortion, Binary data, Transistors, Visualization, Logic

Read Abstract +

Proceedings Article | 5 July 2000 Paper

Phase aware proximity correction for advanced masks

Olivier Toublan, Emile Sahouria, Nicolas Cobb, Thuy Do, Tom Donnelly, Yuri Granik, Franklin Schellenberg, Patrick Schiavone

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.388972

KEYWORDS: Photomasks, Optical proximity correction, Semiconducting wafers, Phase shifts, Image processing, Critical dimension metrology, Manufacturing, Photoresist processing, Mathematical modeling, Model-based design

Read Abstract +

Proceedings Article | 5 July 2000 Paper

OPC beyond 0.18 mm: OPC on PSM gates

Franklin Schellenberg, Olivier Toublan, Nicolas Cobb, Emile Sahouria, Greg Hughes, Susan MacDonald, Craig West

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.388942

KEYWORDS: Photomasks, Reticles, Optical proximity correction, Phase shifts, Phase shifting, Semiconducting wafers, Lithography, Manufacturing, Phase measurement, Etching

Read Abstract +

Proceedings Article | 30 December 1999 Paper

Integration of optical proximity correction strategies in strong phase shifters design for poly-gate layers

Chris Spence, Marina Plat, Emile Sahouria, Nicolas Cobb, Franklin Schellenberg

Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373322

KEYWORDS: Optical proximity correction, Photomasks, Model-based design, Phase shifts, Semiconducting wafers, Distortion, Transistors, Binary data, Computer aided design, Data modeling

Read Abstract +

Showing 5 of 33 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years